Three-Dimensional Nanoimprint Mold Fabrication by Focused-Ion-Beam Chemical Vapor Deposition

Abstract

Three-dimensional diamond-like carbon (DLC) mold fabricated by focused-ion-beam chemical vapor deposition (FIB-CVD) using a precursor of phenanthrene has been applied to a nanoimprint process. Various 3D nanostructure DLC molds have been delineated by FIB-CVD using a computer-controlled pattern generator which is a commercially available pattern generator for electron beam lithography. Then, the molds were imprinted into hydrogen silsequioxane (HSQ) as a material replicated at room temperature. It was confirmed that the 3D mold, after nanoimprint lithography (NIL), kept its original shape, and 3D mold structures were successfully imprinted into HSQ. These results reveal that the 3D mold fabricated by FIB-CVD can be applied to NIL.

Sub-nanoscale nanoimprint fabrication of atomically stepped glassy substrates of silicate glass and acryl polymer

“…The microscale or nanoscale surface morphology of the glassy substrates has an important role to control the device performance [7]. Among the surface microprocesses, the nanoimprinting process is one of the most promising techniques for simple, low-cost, and highthroughput nanopatterning [8,9]. Thermal nanoimprint replication onto the thermoplastic glassy plates can be achieved in a single procedure by pressing the template mold at a temperature near the glass transition temperatures (T g ) of the glassy materials [3].…”

Nanomechanical switch fabrication by focused-ion-beam chemical vapor deposition

“…The pattern drawing system of CPG (CPG-1000: Crestec Co., T. Tajima, Tokyo 192-0045, Japan) was added to the FIB apparatus to draw any patterns. 3,5,6 Using the CPG, a beam scanning control is possible such as scanning speed, x-y direction, and blanking of a beam, and the 3D free-spacenanowiring can be fabricated. Figure 1 illustrates the free-space-nanowiring fabrication process using both FIB-CVD and CPG.…”

Fabrication of SU-8 based nanopatterns and their use as a nanoimprint mold

“…These NIL molds are normally fabricated with electron beam (E-Beam) lithography, and reactive ion etching (RIE) 15 , and focused-ion-beam (FIB) chemical vapor deposition (CVD) 16,17 . Recently, some polymers such as PDMS (Polydimethylsiloxane) draws more attention and is being developed as mold material because of its following merits: 1) PDMS mold can be easily released after imprinting compared to "hard" molds; 2) the elasticity of PDMS makes the imprinting on uneven surface possible; 3) PDMS mold can be wound around rollers for roll-to-roll nanoimprint development.…”