volume 60, issue 6, P2266-2271 1974
DOI: 10.1063/1.1681357
View full text
|
Sign up to set email alerts
|
Share

Abstract: Articles you may be interested inEffect of substrate bias and oxygen partial pressure on properties of RF magnetron sputtered HfO2 thin films J. Vac. Sci. Technol. B 32, 03D104 (2014); 10.1116/1.4825234The reactivity of molecular and atomic oxygen in oxygenexchange reaction between NO and O2 coadsorbed on a Pt (111) surface Pulsednozzle Fouriertransform microwave spectroscopy of laservaporized metal oxides: Rotational spectra and electric dipole moments of YO, LaO, ZrO, and HfO J. Chem. Phys. 92, 4724 (1990)…

Expand abstract

Search citation statements

Order By: Relevance

Citation Types

1
2
0

Paper Sections

0
0
0
0
0

Publication Types

0
0
0
0

Relationship

0
0

Authors

Journals