SHINKU
 1994
DOI: 10.3131/jvsj.37.896
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Thermally Stimulated Desorption Measurements of Heavily Phosphorus-Doped Silicon Surfaces with a Very Thin Oxide Film.

Yoshitomo Kamiura1,
Wen Biao Ying2,
Masafumi Nishimatsu3
et al.
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