In our current work, we have examined the e‐beam sensitivity and thermal processing behavior of pure PBOCST [poly(tert‐butoxycarbonyloxystyrene)]. An alkali soluble latent image can be generated in the PBOCST by e‐beam exposure followed by a post‐exposure bake (PEB) at relatively high temperatures (140 to 150°C). Pattern wet development operates on the same basis as a PBOCST/acid generator two component system. Deprotection, accelerated by the exposure, yields alkali soluble areas, while unexposed ar…
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