1989
DOI: 10.1021/ja00197a054
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The structure of self-assembled monolayers of alkylsiloxanes on silicon: a comparison of results from ellipsometry and low-angle x-ray reflectivity

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Cited by 436 publications
(410 citation statements)
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“…17 Å). Small systematic differences between XRR and ellipsometry data have been previously reported, 35 and do not constitute a reason of concern. 36 2.1.3 Derivatization of SAMs incorporating the redoxswitchable molecule 2.…”
Section: Assembly Of Surface Constructssupporting
confidence: 53%
“…17 Å). Small systematic differences between XRR and ellipsometry data have been previously reported, 35 and do not constitute a reason of concern. 36 2.1.3 Derivatization of SAMs incorporating the redoxswitchable molecule 2.…”
Section: Assembly Of Surface Constructssupporting
confidence: 53%
“…well-established techniques for forming and characterizing them, [231][232][233][234][235][236][237] and in principle, their chemistry should be less complex and therefore more amenable to obtaining detailed molecular level insights. SAMs formed by reaction of trichloroalkylsilanes on SiO x surfaces, for example on the thin oxide layer on silicon, may be particularly relevant to reactions of organic compounds on dust and on building materials for which silicates can be major components.…”
Section: This Journal Is C the Owner Societies 2009mentioning
confidence: 99%
“…First, there was evidence for some multilayer formation on the ZnSe ATR crystal, which may be partly responsible for significantly more scatter in the kinetics data than is the case using a silicon ATR crystal where monolayer formation is well characterized. [231][232][233][234][235][236][237] Second, it may be that the mechanism of formation of CQO is not, indeed, L-H but rather a more complex one that leads to a similar parameterization of the rate data. Given the lack of a convincing mechanism that would lead to L-H kinetics for the disparate surfaces for which it has been suggested, it is clear that much more remains to be understood at a molecular level about the interaction of O 3 , and likely of other oxidants as well, with organics at interfaces.…”
Section: This Journal Is C the Owner Societies 2009mentioning
confidence: 99%
“…21 The advancing and receding contact angles of water on the SAMs of OTS of 110Ϯ2 and 97Ϯ2°, as well as the advancing contact angle of hexadecane on the SAMs of OTS of 43Ϯ2°, agreed well with literature values. [22][23][24][25][26] The advancing contact angles of water on 1Cl and 2Cl films at saturation coverage also were measured, and they were 102Ϯ3 and 105Ϯ3°, respectively. The advancing contact angles for all the n-alcohols used in the friction measurements also were measured on SAMs of OTS.…”
Section: Measurement Of Contact Anglesmentioning
confidence: 99%