Negative bias temperature instability (NBTI) and hot carrier injection (HCI) are two important processes of reliability concern in nano-scale integrated circuits. A circuit-level design technique to combat NBTI degradation is gate oversizing. This paper presents a new technique based on PMOS and NMOS resistance variation for the NBTI-and HCI-aware gate-sizing problem for the first time. In this technique, the area of the circuit is minimized with constraints on degraded delay due to NBTI and HCI and the transitor size. Expreimental results for several gates and ISCAS'85 benchmark circuits show that this technique imposes an area overhead of less than 1% with respect to baseline design in most cases. Zhila Amini (Non-member) received the B.Sc. degree from Sharif University, Tehran, Iran, in 2004, and the M.Sc. degree from Tarbiat Modares University (TMU), Tehran, in 2006, both in electrical engineering. Currently, she is pursuing the Ph.D. degree at TMU. Her research interests include VLSI design and digital electronic and digital CMOS circuit reliability. Abdolreza Nabavi (Non-member) received the B.Sc. and M.Sc. degrees from Tehran University, Tehran, Iran, in 1985 and 1987, respectively, and the Ph.D. degree from McGill University, Canada, in 1993, all in electrical engineering. Since 1993, he has been with Faculty of Electrical and Computer Engineering, Tarbiat Modares University, Tehran. His research interests include RFIC design with emphasis on ultrawide-band and millimeter-wave systems, and low-power analog and digital integrated circuits.