Abstract:Single crystals of
normalGaP
have been grown from the vapor phase in an open tube process on seeds of either
normalGaP
or
normalGaAs
. The reaction between
H2O
and a
normalGaP
source above 700°C in a stream of H2 provides the vapor phase species which react upon cooling to deposit
normalGaP
crystals. Epitaxial layers of
normalGaP
have been grown on substrates at temperatures as low as about 700°C, but the growth rates are extremely small. Substrate temperatures of about 1000°–1080°C and source tem… Show more
“…Close-spaced vapor transport (CSVT) is an alternative deposition technique using only solid precursors, which has been demonstrated for a number of semiconductor materials relevant to PV production [12][13][14][15][16][17]. CSVT can achieve growth rates up to ~1 µm/min [18], but with the potential for better material utilization than MOCVD or HVPE (approaching 100%) because the solid source is placed in close proximity to the substrate with growth rate and material losses determined by diffusion of the in situ generated gas-phase reactants.…”
Precursor and substrate costs currently limit the adoption of III-V photovoltaics for large scale manufacturing. Here, we use water-mediated close-spaced vapor transport (CSVT) to produce homojunction GaAs devices with pressed GaAs powder as an alternative to expensive gas-phase precursors. These unpassivated devices reach V oc > 910 mV, demonstrating the plausibility of CSVT as an alternative method for growth of III-V epitaxial films for photovoltaic devices. We find that Zn-doping of the absorber films decreases after a number of growths cycles using a single source, which suggests an alternative transport agent should be investigated for p-type doping. Performance of these solar cells is largely limited by formation of macroscopic surface defects which we find to be caused by particulate transfer from the source material and the formation of oxide phases during growth. We present strategies for mitigating these defects and improving device performance.
“…Close-spaced vapor transport (CSVT) is an alternative deposition technique using only solid precursors, which has been demonstrated for a number of semiconductor materials relevant to PV production [12][13][14][15][16][17]. CSVT can achieve growth rates up to ~1 µm/min [18], but with the potential for better material utilization than MOCVD or HVPE (approaching 100%) because the solid source is placed in close proximity to the substrate with growth rate and material losses determined by diffusion of the in situ generated gas-phase reactants.…”
Precursor and substrate costs currently limit the adoption of III-V photovoltaics for large scale manufacturing. Here, we use water-mediated close-spaced vapor transport (CSVT) to produce homojunction GaAs devices with pressed GaAs powder as an alternative to expensive gas-phase precursors. These unpassivated devices reach V oc > 910 mV, demonstrating the plausibility of CSVT as an alternative method for growth of III-V epitaxial films for photovoltaic devices. We find that Zn-doping of the absorber films decreases after a number of growths cycles using a single source, which suggests an alternative transport agent should be investigated for p-type doping. Performance of these solar cells is largely limited by formation of macroscopic surface defects which we find to be caused by particulate transfer from the source material and the formation of oxide phases during growth. We present strategies for mitigating these defects and improving device performance.
The photoelectric yield spectrum and energy distributions of the emitted electrons have been measured at photon energies between 3.0 and 6.0 eV on the (110) surface of GaP. Preparation of the emitting surfaces included cleavage in ultrahigh vacuum and deposition of various amounts of cesium. The results are interpreted in terms of direct optical transitions and compared with other optical properties. Photoelectric emission furnishes evidence supporting the interpretation of reflectivity data by Bergstresser et al., and Woolley et al., and the electro-reflectance studies of Cardona and co-workers. Good agreement is found with the band structure of GaP computed by Cohen and Bergstresser.
“…As far as the thermodynamic stability of the pnictides is concerned, phosphides and arsenides are similar as well. Consequently, the most important transport agent for the crystallization of the arsenides is iodine as well (183).…”
Section: Chemical Vapor Transport Of Pnictidesmentioning
confidence: 99%
“…Finally, GaAs can be transported with a mixture of water and hydrogen. The mentioned transport agents are used especially in open systems with flowing gases [183].…”
Section: Chemical Vapor Transport Of Pnictidesmentioning
Figure 12. Progression of theoretical transport rates during the transport of WO 2 with HgX 2 (X = Cl, Br, I) according to [29,30].Chemical Vapor Transport Reactions-Methods, Materials, Modeling http://dx.
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