The Denitridation of Nitrides of Iron, Cobalt and Rhenium Under Hydrogen

Alexander, Anne‐Marie; Hargreaves, J. S. J.; Mitchell, C.

doi:10.1007/s11244-013-0133-z

Cited by 36 publications

(22 citation statements)

References 48 publications

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“…Reduction of ReN x to Re at 400 8 8Ca nd above can be explained by the instability of rhenium nitrides,e ven if ammonia is used here as ac o-reactant. Interestingly Alexander et al [27] have shown Re 3 Nt ol ose close to 90 % of its nitrogen under H 2 atmosphere at 350 8 8C. That is close to the deposition temperature (400 8 8C) where the ALD growth of Re begins instead of ReN x (Figure 1b).…”

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confidence: 54%

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Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Deposition

et al. 2018

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Rhenium is both ar efractory metal and an oble metal that has attractive properties for various applications. Still, synthesis and applications of rhenium thin films have been limited. We introduce herein the growth of both rhenium metal and rhenium nitride thin films by the technologically important atomic layer deposition (ALD) method over awide deposition temperature range using fast, simple,a nd robust surface reactions between rhenium pentachloride and ammonia. Films are grown and characterized for compositions, surface morphologies and roughnesses,c rystallinities,a nd resistivities.C onductive rhenium subnitride films of tunable composition are obtained at deposition temperatures between 275 and 375 8 8C, whereas pure rhenium metal films growa t 400 8 8Ca nd above. Even aj ust 3nmt hickr henium film is continuous and has al ow resistivity of about 90 mW cm showing potential for applications for whicha lso other noble metals and refractory metals have been considered.

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confidence: 54%

“…Interestingly Alexander et al [27] have shown Re 3 Nt ol ose close to 90 % of its nitrogen under H 2 atmosphere at 350 8 8C. Interestingly Alexander et al [27] have shown Re 3 Nt ol ose close to 90 % of its nitrogen under H 2 atmosphere at 350 8 8C.…”

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confidence: 98%

Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Deposition

et al. 2018

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“…Within the literature, active CoRe 4 catalysts have been prepared by pre-treatment of their precursors with NH 3 [8,9]. However, as discussed by Wise and Markel in relation to the binary molybdenum nitride system, ammonolysis is not practical on a large scale for the preparation of nitrides from oxide precursors [13].…”

Section: Resultsmentioning

confidence: 99%

“…Attention has also centred upon Re based catalysts, with bulk Re modified with Co (in the atomic ratio 4:1 Re:Co, hereafter referred to as CoRe 4 ) having been reported to be particularly active [8]. In the case of catalysts comprising of Re alone, a marked degree of deactivation with time on stream was evidenced which has been attributed to decomposition of the active nitride phase to a mixture of rhenium nitride and rhenium metal [8,9]. The high activity of CoRe 4 has been attributed to stabilisation of a nitride phase [8].…”

Section: Introductionmentioning

confidence: 99%

The influence of pre-treatment gas mixture upon the ammonia synthesis activity of Co–Re catalysts

McAulay

Hargreaves

McFarlane

et al. 2015

Catalysis Communications

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CoRe 4 catalysts highly active for ammonia synthesis at ambient pressure and 400°C can be prepared without an ammonolysis stage. Pre-treatments under 3:1 H 2 :N 2 and 3:1 H 2 :Ar atmospheres are shown to influence catalytic performance with the latter treatment leading to an induction period prior to development of activity upon switching to an ammonia synthesis feedstream. The difference in behaviour between the two pre-treatment atmospheres is manifested in temperature programmed nitrogen isotopic exchange experiments where H 2 :Ar treated material is inactive and its H 2 :N 2 treated counterpart is active.

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“…Reduction of ReN x to Re at 400 °C and above can be explained by the instability of rhenium nitrides, even if ammonia is used here as a co‐reactant. Interestingly Alexander et al . have shown Re 3 N to lose close to 90 % of its nitrogen under H 2 atmosphere at 350 °C.…”

Section: Figurementioning

confidence: 99%

Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Deposition

et al. 2018

View full text Add to dashboard Cite

Rhenium is both a refractory metal and a noble metal that has attractive properties for various applications. Still, synthesis and applications of rhenium thin films have been limited. We introduce herein the growth of both rhenium metal and rhenium nitride thin films by the technologically important atomic layer deposition (ALD) method over a wide deposition temperature range using fast, simple, and robust surface reactions between rhenium pentachloride and ammonia. Films are grown and characterized for compositions, surface morphologies and roughnesses, crystallinities, and resistivities. Conductive rhenium subnitride films of tunable composition are obtained at deposition temperatures between 275 and 375 °C, whereas pure rhenium metal films grow at 400 °C and above. Even a just 3 nm thick rhenium film is continuous and has a low resistivity of about 90 μΩ cm showing potential for applications for which also other noble metals and refractory metals have been considered.

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The Denitridation of Nitrides of Iron, Cobalt and Rhenium Under Hydrogen

Cited by 36 publications

References 48 publications

Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Deposition

Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Deposition

The influence of pre-treatment gas mixture upon the ammonia synthesis activity of Co–Re catalysts

Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Deposition

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