The conductive behavior and structural characteristics in the I+-beam-implanted layer of plasma-polymerized pyrrole film

Abstract

A dense organic film was prepared by plasma polymerization of pyrrole. A 20 keV I ϩ implantation at a fluence of 1 ϫ 10 16 ions cm Ϫ2 was used to produce a conducting surface layer due to doping. The characteristics of the implanted layer have been investigated using ion beam analysis techniques, X-ray photoelectron spectroscopy, and near-infrared to ultraviolet spectroscopy. The charge carriers transport in this implanted layer was also analyzed in the temperature region of 120 to 297 K.