International Conference on Extreme Ultraviolet Lithography 2021 2021
DOI: 10.1117/12.2601008
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TEUS: high-brightness EUV LPP light source based on fast rotating target: product overview and specifications

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“…EUV transmittance measurements of a free-standing SWCNT membrane were carried out in a chamber of the TEUS-S-100 light source [36], which employs pulsed laser radiation at the wavelength of 1.064 μm with the following parameters: an average output power of 100 W, energy of each pulse of 4 mJ, pulse repetition rate of 25 kHz, and pulse width of 1.5 ns (Nd: YVO4 laser system from EdgeWave [37]).…”
Section: Methodsmentioning
confidence: 99%
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“…EUV transmittance measurements of a free-standing SWCNT membrane were carried out in a chamber of the TEUS-S-100 light source [36], which employs pulsed laser radiation at the wavelength of 1.064 μm with the following parameters: an average output power of 100 W, energy of each pulse of 4 mJ, pulse repetition rate of 25 kHz, and pulse width of 1.5 ns (Nd: YVO4 laser system from EdgeWave [37]).…”
Section: Methodsmentioning
confidence: 99%
“…The renewal abilities of the SWCNT pellicles were assessed within the industrial TEUS-S-100 EUV light source [36]. The laser beam was focused on the liquid target (In/Sn alloy with the mass proportion of 48/52) surface with a focal spot size of 60 μm (1/e 2 intensity level).…”
Section: In Situ Renewalmentioning
confidence: 99%