Synthesis and characterization of single-phase epitaxial Cr2N thin films by reactive magnetron sputtering

Gharavi, Mohammad Amin; Greczyński, Grzegorz; Eriksson, Fredrik; Lu, Jun; Balke, Benjamin; Fournier, Danièle; Febvrier, Arnaud Le; Pallier, Camille; Eklund, Per

doi:10.1007/s10853-018-2914-z

Cited by 16 publications

(8 citation statements)

References 43 publications

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“…Most of the characterization approach is analogous to our previous work [35]. X-ray diffraction (XRD) θ-2θ scans were measured in a PANalytical X'Pert PRO diffractometer system (Cu Kα) (Malvern Panalytical, Almelo, The Netherlands) operated at 45 kV and 40 mA.…”

Section: Methodsmentioning

confidence: 99%

Phase Transformation and Superstructure Formation in (Ti0.5, Mg0.5)N Thin Films through High-Temperature Annealing

Gharavi

Febvrier

et al. 2021

Coatings

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(Ti0.5, Mg0.5)N thin films were synthesized by reactive dc magnetron sputtering from elemental targets onto c-cut sapphire substrates. Characterization by θ–2θ X-ray diffraction and pole figure measurements shows a rock-salt cubic structure with (111)-oriented growth and a twin-domain structure. The films exhibit an electrical resistivity of 150 mΩ·cm, as measured by four-point-probe, and a Seebeck coefficient of −25 µV/K. It is shown that high temperature (~800 °C) annealing in a nitrogen atmosphere leads to the formation of a cubic LiTiO2-type superstructure as seen by high-resolution scanning transmission electron microscopy. The corresponding phase formation is possibly influenced by oxygen contamination present in the as-deposited films resulting in a cubic superstructure. Density functional theory calculations utilizing the generalized gradient approximation (GGA) functionals show that the LiTiO2-type TiMgN2 structure has a 0.07 eV direct bandgap.

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Section: Methodsmentioning

confidence: 99%

Phase Transformation and Superstructure Formation in (Ti0.5, Mg0.5)N Thin Films through High-Temperature Annealing

Gharavi

Febvrier

et al. 2021

Coatings

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“…It is known that chromium nitrides have parasitic phases, e. g. Cr2N, [23][24][25] or CrN1-x phase induced by nitrogen vacancies under reduced deposition conditions. To obtained direct information about the chemical composition of CrN films, we carried out secondary-ion mass spectrometry (SIMS) measurements on a 50 nm-thick CrN 111 film (see Fig.…”

Section: S2 In the Supplemental Materialsmentioning

confidence: 99%

Structural twinning-induced insulating phase in CrN (111) films

Jin

Wang

Zhang

et al. 2021

Phys. Rev. Materials

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Electronic states of a correlated material can be effectively modified by structural variations delivered from a single-crystal substrate. In this letter, we show that the CrN films grown on MgO (001) substrates have a (001) orientation, whereas the CrN films on α-Al2O3 (0001) substrates are oriented along (111) direction parallel to the surface normal. Transport properties of CrN films are remarkably different depending on crystallographic orientations. The critical thickness for the metal-insulator transition (MIT) in CrN 111 films is significantly larger than that of CrN 001 films. In contrast to CrN 001 films without apparent defects, scanning transmission electron microscopy results reveal that CrN 111 films exhibit strain-induced structural defects, e. g. the periodic horizontal twinning domains, resulting in an increased electron scattering facilitating an insulating state. Understanding the key parameters that determine the electronic properties of ultrathin conductive layers is highly desirable for future technological applications.

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“…Chromium nitrides have very similar properties, such as hardness (γ-CrN -13-17 GPa, β-Cr 2 N -18.5 GPa) and bulk modulus (γ-CrN -243 (10) GPa, β-Cr 2 N -275 (23) GPa) [29][30][31][32]. Both phases are used in hard coatings and thermoelectric materials.…”

Section: Introductionmentioning

confidence: 99%

Mechanosynthesis of β-Cr2N using BN as the nitrogen source

et al. 2022

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The mechanosynthesis of hexagonal chromium nitride (?-Cr2N) is explored by the high-energy ball-milling of Cr and h-BN. The ?-Cr2N onset formation is observed after 20 min of milling, although the complete reaction is achieved at 100 min of milling. Two different 1Cr:1BN and 2Cr:1BN molar ratios were evaluated, observing that the molar ratio plays an essential role in the end products during mechanosynthesis. The products were characterized by XRD, FTIR and Raman spectroscopy, thermal analysis (TGA and DSC), SEM, and surface area (BET). A preliminary phase stability map vs. accumulative energy (?Evaccum) has been constructed. The accumulative energy needed for the complete ?-Cr2N formation is ?Evaccum > 720 kJ/g.

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Synthesis and characterization of single-phase epitaxial Cr2N thin films by reactive magnetron sputtering

Cited by 16 publications

References 43 publications

Phase Transformation and Superstructure Formation in (Ti0.5, Mg0.5)N Thin Films through High-Temperature Annealing

Phase Transformation and Superstructure Formation in (Ti0.5, Mg0.5)N Thin Films through High-Temperature Annealing

Structural twinning-induced insulating phase in CrN (111) films

Mechanosynthesis of β-Cr2N using BN as the nitrogen source

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