2015
DOI: 10.1109/lpt.2015.2405611
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Surface-Grating-Coupled Low-Loss Ge-on-Si Rib Waveguides and Multimode Interferometers

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Cited by 97 publications
(48 citation statements)
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“…One strategy involves replacing the lossy silicon oxide cladding with other materials exemplified by silicon-on-nitride ( Figure 3A-B) [10] and germanium-on-nitride [17] or with air cladding in pedestal [11,18,19] or suspended silicon structures [12][13][14][20][21][22][23] (Figure 3C-H). Another option is Ge-on-Si (or SiGeon-Si), which claims the advantage of compatibility with Si CMOS processing, as high-quality Ge can be epitaxially grown on Si ( Figure 3I-J) [15,17,[24][25][26][27][28]. Furthermore, the high index of Ge means that the Si substrate can function as the bottom cladding.…”
Section: Waveguides and Passive Devicesmentioning
confidence: 99%
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“…One strategy involves replacing the lossy silicon oxide cladding with other materials exemplified by silicon-on-nitride ( Figure 3A-B) [10] and germanium-on-nitride [17] or with air cladding in pedestal [11,18,19] or suspended silicon structures [12][13][14][20][21][22][23] (Figure 3C-H). Another option is Ge-on-Si (or SiGeon-Si), which claims the advantage of compatibility with Si CMOS processing, as high-quality Ge can be epitaxially grown on Si ( Figure 3I-J) [15,17,[24][25][26][27][28]. Furthermore, the high index of Ge means that the Si substrate can function as the bottom cladding.…”
Section: Waveguides and Passive Devicesmentioning
confidence: 99%
“…For photonic devices operating at even longer wavelengths, alternative materials other than Reprinted with permission from [11], (D, E) schematic view and top-view SEM image of suspended Si mid-IR micro-ring resonators [12] (© 2013 Optical Society of America), the waveguides assume a ridge geometry and an undercut etch removes the silicon dioxide cladding through access holes on the slab layer, (F, G) SEM micrographs of a suspended mid-IR Si photonic crystal cavity [13] (© 2011 Optical Society of America), (H) suspended mid-IR Si waveguides with sub-wavelength grating (SWG) claddings [14] (© 2016 Optical Society of America); here the SWG provides both lateral optical confinement as well as access to the oxide under cladding during wet etch structure release; the arrows indicate light propagation direction in the suspended core. (I, J) Ge-on-Si [15] (© 2015 IEEE): (I) a mid-IR Ge-on-Si ridge waveguide; (J) TEM cross-sectional image of the Ge-on-Si film showing that the dislocations are confined at the Si/Ge interface. (K, L) Chalcogenide glass-on-silicon [16] (© 2013 Optical Society of America): (K) top-view optical micrograph of a ChG micro-disk resonator, (L) cross-sectional structure and simulated whispering gallery mode profile in the micro-disk at 5.2-μm wavelength; the high-index As 2 Se 3 glass forms the core layer surrounded by low-index Ge 23 Sb 7 S 70 glass cladding.…”
Section: Waveguides and Passive Devicesmentioning
confidence: 99%
“…Scientific, medical, industrial, and military technologies using MIR wavelengths can potentially be addressed with applications in spectroscopic analysis [1], biological sensing [2], environmental monitoring [3], and astronomy [4]. While a number of passive MIR photonic waveguides and devices have been constructed on a variety of silicon waveguide platforms [5][6][7][8], the development of integrated active components on silicon for longer wavelengths has been more limited. Thermo-optic phase shifters for the 5 µm range [9], heterogeneously integrated InP-based type-II photodiodes for wavelengths up to 2.4 µm [10], demultiplexers for the 2 µm range utilizing an array of similar photodiodes [11], a fully integrated spectrometer utilizing an array of InAs 0.91 Sb 0.09 -based photodiodes for 3-4 µm [12], and multiple-quantum-well InGaAs lasers which emit 2.01 µm light in continuous wave (CW) mode at room temperature [13] have been reported.…”
Section: Introductionmentioning
confidence: 99%
“…Germanium-on-silicon offers a waveguide platform that 1) is widely transparent from 2 to 14 μm (appropriate waveguide design can ensure high mode confinement and large bend radius that allows us to overcome higher loss due to silicon underneath at wavelengths >10 μm), 2) has a straightforward fabrication scheme, and 3) can be mass manufactured in CMOS or MEMS foundries. Several passive and active functionalities [19][20][21] have been demonstrated on this waveguide platform.…”
Section: Introductionmentioning
confidence: 99%