2006
DOI: 10.1016/j.cplett.2006.07.063
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Surface-enhanced infrared absorption spectroscopy using chemically deposited Pd thin film electrodes

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Cited by 48 publications
(53 citation statements)
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“…9). This band is much weaker in a strong acid solution like 0.1 M HClO 4 or H 2 SO 4 [31,36,69]. It's tempting to assign it to the O Si O stretching of the silicon oxides formed (and/or grown) on the exposed Si sites [70], which is thermodynamically facilitated with increasing local pH upon hydrogen evolution.…”
Section: In Situ Seiras On Cu-on-si Electrodementioning
confidence: 96%
See 1 more Smart Citation
“…9). This band is much weaker in a strong acid solution like 0.1 M HClO 4 or H 2 SO 4 [31,36,69]. It's tempting to assign it to the O Si O stretching of the silicon oxides formed (and/or grown) on the exposed Si sites [70], which is thermodynamically facilitated with increasing local pH upon hydrogen evolution.…”
Section: In Situ Seiras On Cu-on-si Electrodementioning
confidence: 96%
“…A key issue for successfully implementing this technique is to fabricate appropriate nanoparticle metal films that can produce strong SEIRA effect while maintain essentially the same electrochemical properties as their bulk counterparts. Recently triggered by the effort in Osawa's group [24], simple wet fabrication techniques [25][26][27][28][29][30][31][32][33][34][35][36][37][38][39][40] (including chemical deposition and electrochemical deposition of metallic nanoparticle films on an IR window such as Si and Ge) are developing rapidly, with an expectation to replace the traditional and expensive dry process fabrication (including vacuum evaporation and sputtering). A SEIRA-active Cu film chemically deposited on a Ge element has been reported [29].…”
Section: Introductionmentioning
confidence: 99%
“…Since the feature around 1250 cm -1 is commonly observed also for other metals deposited on Si [35,40,41] and not on Ag and Cu deposited on Ge [42], this band may be assigned to a S-O stretching mode of Si oxide on the prism. The potential dependence of the bipolar feature may not be due to an electrochemical reaction because the prism was fully covered by the Pt thin film and not in direct contact with the solution.…”
Section: Underpotentially Deposited Hydrogen H Updmentioning
confidence: 99%
“…Metals meet the condition that the real part of the dielectric function is larger than the imaginary component [15] like Al [32], Pt [33], Pd [33,34], Ru [33], Rh [33], Sn [13], Ni [35,36], Pb [37] can also be used as SEIRAS substrates. Since the substrates sometimes are used as working electrode, the variety of material choices extremely enriches the applications for ATR-SEIRAS.…”
Section: Prisms and Substrates Used In Atr-seirasmentioning
confidence: 99%
“…Dependent on the use of electrochemical workstation or not, chemical methods are divided into electroless deposition and electrochemical deposition. In electroless deposition, chemical reactions between solutes and prisms take place on the prism surface, forming large area of metal films with islands or gaps [48,49]. A derivate method is to disperse nanocrystal seeds on the prism surface and control the chemical deposition extending from the seeds [21,50].…”
Section: Substrates Fabricationmentioning
confidence: 99%