volume 135, issue 1, P1-9 2006
DOI: 10.1016/j.mseb.2006.06.043
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Abstract: Nanocomposite Ti-Al-Si-N films (Al content ranging from 0 to 16.7 at.% and Si from 0 to 11.8 at.%, respectively) were prepared on Si(1 0 0) substrates at 500 • C by reactive close-field unbalanced magnetron sputtering in an Ar-N 2 mixture. The chemical composition, bonding structure, surface morphology, microstructure, stress and mechanical properties of these films were systematically investigated by means of energy dispersive spectrometry (EDS), X-ray photoelectron spectroscopy (XPS), atomic force microscop…

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