1981
DOI: 10.1116/1.571227
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Submicroscopic pattern replication with visible light

Abstract: Contact imaging with visible light is possible at submicroscopic resolution because the near field of a radiating object contains information of sufficiently high resolution. In this paper we demonstrate this principle by contact imaging of planar submicroscopic metal patterns with blue light (400 nm). Experimental details are described for two experiments: (1) The shadow of an opaque pattern was recorded on a negative photoresist and developed using permanganate staining. (2) An image of a transparent metal p… Show more

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Cited by 404 publications
(230 citation statements)
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“…86 The self-assembly is accomplished simply by depositing a colloidal suspension on a substrate and allowing the solvent to evaporate. In this step, suspensions of latex spheres may be deposited by a number of simple methods, including drop-casting, 90 spin-coating, 91 or convective self-assembly. 92 As the solvent evaporates, the suspended spheres are pulled together by capillary forces to form a hexagonally close-packed monolayer or bilayer.…”
Section: Nanosphere Lithographymentioning
confidence: 99%
See 1 more Smart Citation
“…86 The self-assembly is accomplished simply by depositing a colloidal suspension on a substrate and allowing the solvent to evaporate. In this step, suspensions of latex spheres may be deposited by a number of simple methods, including drop-casting, 90 spin-coating, 91 or convective self-assembly. 92 As the solvent evaporates, the suspended spheres are pulled together by capillary forces to form a hexagonally close-packed monolayer or bilayer.…”
Section: Nanosphere Lithographymentioning
confidence: 99%
“…90 They deposited the colloidal mask simply by drop-casting a suspension of latex spheres onto the substrate. Platinum was vacuum deposited on top of the mask to create a pattern that was further processed and used for contact imaging.…”
Section: Nanosphere Lithographymentioning
confidence: 99%
“…This 2 Introduction to use a colloid monolayer as lithographic mask, [4] the subject is far from being old news. When…”
Section: General Procedures 212 62 Materials 215 63 Experimental Dementioning
confidence: 99%
“…To address these issues, new lithographic and patterning techniques have been developed to improve upon conventional serial methods of templating nanoscale features from evaporated metal films 9,10 . However, all of these methods are limited in the feature sizes and geometries that can be accessed and offer little control over surface roughness, which has important implications in generating local fields with high radiative efficiencies 11 .…”
mentioning
confidence: 99%