Sub-micron grating formation in Ta2O5-waveguides by femtosecond UV-laser ablation

Beinhorn, F.; Ihlemann, J.; Simon, Péter; Marowsky, G.; Maisenholder, B.; Edlinger, Johannes; Neuschäfer, D.; Anselmetti, Dario

doi:10.1016/s0169-4332(98)00390-0

Cited by 36 publications

(8 citation statements)

References 7 publications

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“…Figure 9 shows a grating with 500 nm period made in a Ta 2 O 5 -film with the described ultrashort pulse excimer laser. Such gratings may by applied for coupling light into planar waveguide, or for the so-called grating waveguide structures, which are used, for example, for biosensors based on fluorescence detection [22][23][24]. Also SiO 500 nm layers can be patterned with high resolution using this UV-fs laser system (Figure 10).…”

Section: High-resolution Patterningmentioning

confidence: 99%

Processing of Dielectric Optical Coatings by Nanosecond and Femtosecond UV Laser Ablation

et al. 2008

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Recommended by Jacques AlbertMicroprocessing of dielectric optical coatings by UV laser ablation is demonstrated. Excimer laser ablation at deep UV wavelengths (248 nm, 193 nm) is used for the patterning of thin oxide films or layer stacks. The layer removal over extended areas as well as sub-μm-structuring is possible. The ablation of SiO 2 , Al 2 O 3 , HfO 2 , and Ta 2 O 5 layers and layer systems has been investigated. Due to their optical, chemical, and thermal stability, these inorganic film materials are well suited for optical applications, even if UV-transparency is required. Transparent patterned films of SiO 2 are produced by patterning a UV-absorbing precursor SiO x suboxide layer and oxidizing it afterwards to SiO 2 . In contrast to laser ablation of bulk material, in the case of thin films, the layer-layer or layer-substrate boundaries act as predetermined end points, so that precise depth control and a very smooth surface can be achieved. For large area ablation, nanosecond lasers are well suited; for patterning with submicron resolution, femtosecond excimer lasers are applied. Thus the fabrication of optical elements like dielectric masks, pixelated diffractive elements, and gratings can be accomplished.

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Section: High-resolution Patterningmentioning

confidence: 99%

Processing of Dielectric Optical Coatings by Nanosecond and Femtosecond UV Laser Ablation

et al. 2008

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“…Generally, these materials have lower UV absorption and higher thermal diffusivity than organic polymers. As a consequence, the use of fs pulses for ablation and structuring of these oxide materials, which are important for applications in integrated optics and sensor technology, leads to better performance as compared to ns-pulse ablation [15,16]. The irradiation of e.g.…”

Section: Periodic Structures In Optical Materialsmentioning

confidence: 99%

Periodic Nanostructures

Apel¹,

Beinhorn²,

Ihlemann³

et al. 2000

Zeitschrift Für Physikalische Chemie

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“…Compared with the organic materials, however, the inorganic gratings certainly have some advantages in these aspects. Presently, some processes, such as laser ablation or femtosecond laser ablation, have been proposed, by which inorganic gratings can be fabricated successfully [3,4] . But these processes also have some inevitable disadvantages, such as higher technical difficulty and cost, longer processing duration, and furthermore, the gratings obtained are usually with irregular edges.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of inorganic film gratings and study on their diffraction properties

Wang

Zhao

et al. 2008

Sci. China Ser. E-Technol. Sci.

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A novel process for fabricating high-density and high diffraction efficiency inorganic gratings has been proposed by combining laser interference and chemical etching. In the present work, UV photosensitive Zr-contained sol was synthesized, and photosensitive ZrO 2 /BzAc gel films on (100) silicon were prepared using the sol-gel method. Subsequently, inorganic film gratings with a pitch of 1 μm were fabricated by laser interference in this photosensitive gel film combining with the process of heat treatment. In order to increase the depth-to-width ratio of the gratings, chemical etching was adopted by using iodine-saturated KOH as anisotropic etchant, which improved the diffraction efficiency of the gratings effectively. Furthermore, the diffraction efficiency was improved by gold coating to enhance the surface glossiness and reflection coefficient.sol-gel, high-density gratings, laser interference, chemical etching, diffraction efficiency

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Sub-micron grating formation in Ta2O5-waveguides by femtosecond UV-laser ablation

Cited by 36 publications

References 7 publications

Processing of Dielectric Optical Coatings by Nanosecond and Femtosecond UV Laser Ablation

Processing of Dielectric Optical Coatings by Nanosecond and Femtosecond UV Laser Ablation

Periodic Nanostructures

Fabrication of inorganic film gratings and study on their diffraction properties

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