SU-8 Photolithography as a Toolbox for Carbon MEMS

Martínez-Duarte, Rodrigo

doi:10.3390/mi5030766

Cited by 73 publications

(77 citation statements)

References 70 publications

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“…Results are shown in figure 2. Similar to results obtained by other authors (13), it was observed that the shrinkage in height for tall posts is less than that seen with shorter posts of the same cross section. In order to analyze shrinkage, the % shrinkage in height and diameter, as calculated using equation 1, was plotted against the aspect ratio of the original SU-8 post ( fig.…”

Section: Resultssupporting

confidence: 90%

Shrinkage Analysis of Carbon Micro Structures Derived from SU-8 Photoresist

2016

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We present preliminary results for the analysis of shrinkage of 3D carbon posts obtained by the pyrolysis of SU-8 precursor structures, in a technique known as Carbon MEMS. Though the shrinkage in the carbon structures is highly reproducible, there is a strong dependence of this shrinkage on the initial dimensions of the SU-8 pillars. Our hypothesis is that the shrinkage depends upon the area available for degassing during carbonization. In this work, this idea is used to analyze shrinkage in cylindrical pillars. The results obtained are studied based on the ratio of lateral and top surface area available for degassing and reinforce the hypothesis about the dependence on surface area.

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Section: Resultssupporting

confidence: 90%

Shrinkage Analysis of Carbon Micro Structures Derived from SU-8 Photoresist

2016

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“…As shown in Figure 6c, few bright spots were observed in the magnified fluorescent microscope after photolithography. In addition, pattern uniformity (e.g., thickness, a line‐edge roughness, and a line‐width roughness) is also very important for the fabrication of microelectronic systems 37. As shown in Figure 6d,e, scanning electron microscope (SEM) also exhibited the good pattern clearance.…”

Section: Introductionmentioning

confidence: 94%

“…Alternatively, low toxic solvents (e.g., ethanol)25 have been introduced but are impractical due to the low flash point. In addition, severe QD aggregation4,13,16,26–29 during dispersion and micro‐patterning30–35 is the next notable problem, which is caused by the incompatibility between the surface ligand and binders such as polymers, reactive monomers/oligomers, and functional additives in the photopolymerizable mixtures 36–39…”

Section: Introductionmentioning

confidence: 99%

Design Principle of Reactive Components for Dimethacrylate‐Terminated Quantum Dots: Preserved Photoluminescent Quantum Yield, Excellent Pattern Uniformity, and Suppression of Aggregation in the Matrix

Lee

2020

Macro Chemistry & Physics

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With the advent of various quantum dot (QD)‐based application technologies, the demand for low‐cost, eco‐friendly, high‐performance nanocomposites (e.g., QD photoresist) is rapidly increasing. However, the aggregation phenomenon due to incompatibility between QDs and components is still a limitation in industrial use. Herein, the principle of selecting reactive components that inhibit aggregation and preserve photoluminescent properties is presented. For model QDs (bis[2‐(methacryloyloxy)ethyl] phosphate/1‐dodecanethiol [BMEP/DDT] capped QDs), BMEP allows copolymerization and coadded DDT minimizes the loss of absolute quantum yield during ligand exchange. Besides, bisphenol A ethoxylate dimethacrylate (Mn: ≈1700, polyethylene oxide) suppresses aggregation in the matrix and provide high solubility in alkaline solution. More specifically, the coated thin film (1.0 µm thick) containing up to 20.0 wt% QDs exhibits not only transmittance of more than 85% at 550 nm, but also excellent pattern uniformity at high resolution.

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“…By contrast, the development of carbon thin‐film electrochemical platforms is scarce and has been kept going. The ones developed so far are mainly produced by photolithographic patterning and subsequent carbonization of photoresists like SU‐8 . However, the stability of these devices is compromised by the weak interfacial adhesion to the substrate, which is manifested by film flaking during immersion in the different solvents required for film processing and operation of the resulting electrochemical devices.…”

Section: Electroanalytical Devices Made With Resorcinol‐formaldehyde mentioning

confidence: 99%

Metal Nanoparticle Carbon Gel Composites in Environmental Water Sensing Applications

Niu

Gich

Roig

et al. 2018

The Chemical Record

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The synthesis of organic-inorganic nanocomposites that can interact with different environmental pollutants and can be mass-produced are very promising materials for the fabrication of chemical sensor devices. Among them, metal (or metal oxide) nanoparticles doped conductive porous carbon composites can be readily applied to the production of electrochemical sensors and show enhanced sensitivity for the measurement of water pollutants, thanks to the abundant accessible and functional sites provided by the interconnected porosity and the metallic nanoparticles, respectively. In this personal account, an overview of several synthesis routes of porous carbon composites containing metallic nanoparticles is given, paying special attention to those based on sol-gel techniques. These are very powerful to synthesize hybrid porous materials that can be easily processed into powders and thin films, so that they can be implemented in electrode fabrication processes based on screen-printing and lithography techniques, respectively. We emphasize the sol-gel routes developed in our group for the synthesis of bismuth or gold nanoparticle doped porous carbon composites applied to fabricate electrochemical sensors that can be scaled down to produce miniaturized on-chip sensing devices for the sensitive detection of heavy metal pollutants in water. The trend towards the miniaturization of electrochemical sensors to be readily employed as analytical tools in environmental monitoring follow the market requirements of rapid and accurate on-site analysis, small sample consumption and waste production, as well as potential for continuous or semi-continuous in-situ determination of a wide variety of target analytes.

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SU-8 Photolithography as a Toolbox for Carbon MEMS

Cited by 73 publications

References 70 publications

Shrinkage Analysis of Carbon Micro Structures Derived from SU-8 Photoresist

Shrinkage Analysis of Carbon Micro Structures Derived from SU-8 Photoresist

Design Principle of Reactive Components for Dimethacrylate‐Terminated Quantum Dots: Preserved Photoluminescent Quantum Yield, Excellent Pattern Uniformity, and Suppression of Aggregation in the Matrix

Metal Nanoparticle Carbon Gel Composites in Environmental Water Sensing Applications

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