Structure, mechanical and tribological properties of sputtered Ti1–xAlxN coatings with 0.5≤x≤0.75

Kutschej, K.; Mayrhofer, P.H.; Kathrein, M.; Polcik, P.; Tessadri, Richard; Mitterer, Christian

doi:10.1016/j.surfcoat.2004.12.008

Cited by 193 publications

(75 citation statements)

References 25 publications

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“…3,17,18 First-principles calculations show that the magnitude of the isostructural cubic mixing enthalpy of Sc 1−x Al x N is very similar as for Ti 1−x Al x N. 19,20 Unlike Ti 1−x Al x N, there is no electronic band-structure driving force for decomposition in Sc 1−x Al x N but instead there is a large volume mismatch inducing a positive mixing enthalpy. Like in Ti 1−x Al x N, though, higher AlN contents yield a mixed system including w-Sc 1−x Al x N. 16 In this work, we performed experiments of the thermal stability and decomposition mechanism during annealing of metastable c-Sc 0.57 Al 0.43 N and c-Ti 0.51 Al 0.49 N films.…”

Section: Introductionmentioning

confidence: 98%

“…Many transition-metal ͑TM͒ nitrides, e.g., TiN and CrN, form pseudobinary alloys with AlN in rocksalt structure ͑c-͒ TM 1−x Al x N. These alloys are extensively used to increase the lifetime and cutting speed of coated tools [1][2][3] and Ti 1−x Al x N is by far the most explored system within this field. It is superior to TiN, which oxidizes rapidly above 550°C leading to deteriorated mechanical properties.…”

Section: Introductionmentioning

confidence: 99%

“…This effect is more pronounced for AlN concentrations above 50%. 13 Sc-Al-N is in contrast to Ti-Al-N still a relatively unexplored material system, with the inverse perovskite Sc 3 AlN being the only reported ternary compound.…”

Section: Introductionmentioning

confidence: 99%

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Effects of volume mismatch and electronic structure on the decomposition of ScAlN and TiAlN solid solutions

et al. 2010

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Thin solid films of metastable rocksalt structure ͑c-͒ Sc 1−x Al x N and Ti 1−x Al x N were employed as model systems to investigate the relative influence of volume mismatch and electronic structure driving forces for phase separation. Reactive dual magnetron sputtering was used to deposit stoichiometric Sc 0.57 Al 0.43 N͑111͒ and Ti 0.51 Al 0.49 N͑111͒ thin films, at 675°C and 600°C, respectively, followed by stepwise annealing to a maximum temperature of 1100°C. Phase transformations during growth and annealing were followed in situ using x-ray scattering. The results show that the as-deposited Sc 0.57 Al 0.43 N films phase separate at 1000-1100°C into nonisostructural c-ScN and wurtzite structure ͑w-͒ AlN, via nucleation and growth at domain boundaries. Ti 0.51 Al 0.49 N, however, exhibits spinodal decomposition into isostructural coherent c-TiN and c-AlN, in the temperature interval of 800-1000°C. X-ray pole figures show the coherency between c-ScN and w-AlN, with AlN͑0001͒ ʈ ScN͑001͒ and AlN͗0110͘ ʈ ScN͗110͘. First-principles calculations of mixing energy-lattice spacing curves explain the results on a fundamental physics level and open a route for design of novel metastable pseudobinary phases for hard coatings and electronic materials.

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Section: Introductionmentioning

confidence: 98%

Section: Introductionmentioning

confidence: 99%

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Effects of volume mismatch and electronic structure on the decomposition of ScAlN and TiAlN solid solutions

et al. 2010

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“…However, Metals 2017, 7, 52 2 of 10 magnetron sputtering [18,19] is a widely used method for depositing Ti-Al-N coatings due to control of the film thickness, structure and properties. However, the influence of nitrogen flow rate at different deposition temperatures on the chemical bonding structure and surface morphology of the coatings is hardly discussed.…”

Section: Introductionmentioning

confidence: 99%

XPS and AFM Investigations of Ti-Al-N Coatings Fabricated Using DC Magnetron Sputtering at Various Nitrogen Flow Rates and Deposition Temperatures

Obrosov

Gulyaev

Ratzke

et al. 2017

Metals

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Ti-Al-N coatings were deposited by direct current magnetron sputtering (DCMS) onto IN 718 at different nitrogen flow rates and deposition temperatures. The coatings' properties were characterized using atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) as well as nanoindentation. It was found that higher deposition temperature leads to higher surface roughness and nitrogen flux influences the shape of grains. According to XPS, the bonding structure of all coatings exhibited the (Ti,Al)N phase. Mechanical properties depend on the Al content within the films. The coating with the best mechanical properties (deposited at 500 • C and 20 standard cubic centimeters per minute (sccm)) was further deposited onto tungsten carbide (WC) cutting tools for cylindrical turning experiments. A quasi-constant flank wear was observed until a machining volume of 23,500 mm 3 .

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“…[3][4][5] Transition metal ͑TM͒ nitrides, e.g., TiN and CrN, form rocksalt structure solid solutions with AlN in TM 1−x Al x N and are extensively used to increase the lifetime and cutting speed of coated tools. [6][7][8] Here, we consider the solid solutions of c-ScN and c-AlN in Sc 1−x Al x N, where Sc and Al are positioned on the metal sublattice and 0 Յ x Յ 1. The Sc-Al-N material system is, in comparison to the related systems mentioned, almost unexplored, with the perovskite Sc 3 AlN as the only reported ternary phase 9 and a brief report about an enhanced piezoelectric response in hexagonal Sc 1−x Al x N. 10 Group IIIA semiconducting w-AlN, with physical properties including wide energy band gap ͑6.2 eV͒, 11 high hardness ͑Ͼ20 GPa͒, 12,13 high thermal conductivity ͑3.19 W / cm K at RT͒, 14 and high-temperature stability ͑melting point of Ͼ2000°C͒, 15 has been extensively studied mainly for optical and electronic device applications.…”

Section: Introductionmentioning

confidence: 99%

Cubic Sc1−xAlxN solid solution thin films deposited by reactive magnetron sputter epitaxy onto ScN(111)

Höglund

Bareño

Birch

et al. 2009

Journal of Applied Physics

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Reactive magnetron sputter epitaxy was used to deposit thin solid films of Sc1−xAlxN (0≤x≤1) onto MgO(111) substrates with ScN(111) seed layers. Stoichiometric films were deposited from elemental Sc and Al targets at substrate temperatures of 600 °C. The films were analyzed by Rutherford backscattering spectroscopy, elastic recoil detection analysis, x-ray diffraction, and transmission electron microscopy. Results show that rocksalt structure (c)-Sc1−xAlxN solid solutions with AlN molar fractions up to ∼60% can be synthesized. For higher AlN contents, the system phase separates into c- and wurtzite structure (w)-Sc1−xAlxN domains. The w-domains are present in three different orientations relative to the seed layer, namely, Sc1−xAlxN(0001)∥ScN(111) with Sc1−xAlxN[1¯21¯0]∥ScN[11¯0], Sc1−xAlxN(101¯1)∥ScN(111) with Sc1−xAlxN[1¯21¯0]∥ScN[11¯0], and Sc1−xAlxN(101¯1)‖ScN(113). The results are compared to first-principles density functional theory calculations for the mixing enthalpies of c-, w-, and zinc blende Sc0.50Al0.50N solid solutions, yielding metastability with respect to phase separation for all temperatures below the melting points of AlN and ScN.

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Structure, mechanical and tribological properties of sputtered Ti1–xAlxN coatings with 0.5≤x≤0.75

Cited by 193 publications

References 25 publications

Effects of volume mismatch and electronic structure on the decomposition of ScAlN and TiAlN solid solutions

Effects of volume mismatch and electronic structure on the decomposition of ScAlN and TiAlN solid solutions

XPS and AFM Investigations of Ti-Al-N Coatings Fabricated Using DC Magnetron Sputtering at Various Nitrogen Flow Rates and Deposition Temperatures

Cubic Sc1−xAlxN solid solution thin films deposited by reactive magnetron sputter epitaxy onto ScN(111)

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