Abstract:Quaternary In0.085Al0.285Ga0.63N/GaN multiple quantum wells (MQW) grown by plasma‐assisted molecular beam epitaxy are characterized by high resolution transmission electron microscopy (HRTEM), geometric phase analysis, and energy dispersive X‐ray (EDX) nano‐analysis. The MQW exhibit sharp well‐defined InAlGaN/GaN interfaces while the GaN/InAlGaN interfaces are more smeared. The InAlGaN quantum wells and the GaN barriers are lattice‐matched. Chemical distribution profiles are extracted from EDX line scans, obta… Show more
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