Step and flash imprint lithography: Template surface treatment and defect analysis

Bailey, Todd; Choi, Byung Jin; Colburn, Matthew; Meissl, Mario; Shaya, S. Y.; Ekerdt, John G.; Sreenivasan, S. V.; Willson, C. Grant

doi:10.1116/1.1324618

Cited by 365 publications

(230 citation statements)

References 19 publications

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“…Therefore, the templates need be treated using a low surface energy, self-assembled monolayer to ensure selective release at the template-etch barrier interface. This surface treatment is very durable and survives repeated imprints and multiple aggressive physical and chemical cleanings (Bhushan, 2007, Costner et al, 2009, DiBiase et al, 2006, Bailey et al, 2000. A common solution of this problem is to deposit a low-surface-energy release layer directly onto the mold.…”

Section: Key Concern For Nil Templates 331 Template Surface Treatmentmentioning

confidence: 99%

Nanoimprint Lithography

강신일¹

2016

Encyclopedia of Nanotechnology

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Section: Key Concern For Nil Templates 331 Template Surface Treatmentmentioning

confidence: 99%

Nanoimprint Lithography

강신일¹

2016

Encyclopedia of Nanotechnology

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“…1b) [14]. In the S-FIL process, a UV photo-curable liquid phase resist, based on monomer or oligomer, is used as the imprinting resin.…”

Section: Principle and Types Of Nil Processmentioning

confidence: 99%

“…Recently, various nano-patterning techniques, such as laser interference lithography [4][5][6], nano-sphere lithography [7][8][9], block copolymer lithography [10][11][12], nanoimprint lithography (NIL) [13][14][15][16][17][18][19][20], have been developed in order to fabricate nano-patterns with low process cost. Conventionally, to fabricate nano-patterns composed of inorganic functional materials via these indirect patterning techniques, four common steps are needed, including deposition of functional materials, formation of polymer resist patterns on the functional material layer, descum of a e-mail: heonlee@korea.ac.kr polymer resist patterns and dry or wet etching of functional materials.…”

Section: Introductionmentioning

confidence: 99%

Recent progress in direct patterning technologies based on nano-imprint lithography

Byeon

Lee

2012

Eur. Phys. J. Appl. Phys.

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Abstract. Nano-imprint lithography (NIL) is one of the most promising patterning technologies, in which nano-and micro-patterns are fabricated on various substrates. NIL provides high throughput and low cost in fabricating nano-structures due to its simple process and allows resolution below 10 nm without issues of light diffraction with conventional lithographic techniques. Its patterning mechanism is based on mechanical deformation of a polymer resist, which is simply done by pressing with a mold. This patterning mechanism also enables inorganic and organic-inorganic hybrid materials to be directly patterned by NIL. This article covers the recent progress of NIL-based direct patterning techniques and their applications to devices. Recently, functional nano-and micro-patterns have been applied to various electronic devices for the enhancement of overall performance. Fabrication methods of these devices are difficult using conventional lithographic techniques due to complex processes, high cost and low throughput. Direct NIL technique using functional resist can simply fabricate functional nano-and micro-structures and thus can be usefully applied to various industries.

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“…One of the key challenges of nanoimprint is how to make defect-free templates that offer robust low surface energy for template-substrate separation, long lifetime, and low fabrication cost [2]. However, due to the physical contact during imprinting, the conventional silicon and quartz templates suffer serious wearing damage after a certain number of imprint cycles, which shortens template life time and increases manufacturing cost [3,4]. To alleviate this problem, hard material such as diamond [5] and SiC [6] has been investigated to make high wear resistance templates.…”

Section: Introductionmentioning

confidence: 99%

Nanofabrication of Diamond-like Carbon Templates for Nanoimprint Lithography

et al. 2006

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Diamond like carbon (DLC) films were deposited on Si and then patterned to form 40 nm features as nanoimprint templates. A plasma enhanced chemical vapor deposition (PECVD) system with CH4 precursor was used to deposit DLC films on Si and quartz substrates. These films were then characterized using Raman spectroscopy, atomic force microscopy (AFM), nanoindentation, and contact angle measurement. By varying the RF power and pressure of the PECVD, DLC films with good uniformity, smooth surfaces (<0.2 nm RMS), low surface energy (~40 mJ/m 2 ), and high hardness (~22 GPa) were achieved. Nanoimprint lithography and liftoff process were used to pattern Cr mask on DLC films. An inductively coupled plasma (ICP) etching process was performed with CF 4 to transfer the patterns into the DLC films to form nanostructured template for nanoimprint. Water contact angles on the patterned DLC templates were measured and were stable at about 70° under thermal annealing at 180 °C for more than 12 hours. With these DLC templates, UV and reversal UV nanoimprint lithography were carried out on SU-8 at typical imprint conditions. The fidelity of pattern-transfer was investigated. These experimental results indicate that DLC is an excellent material for nanoimprint templates because of its high wear resistance, robust low surface energy, UV transparency, and ease of patterning.

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Step and flash imprint lithography: Template surface treatment and defect analysis

Cited by 365 publications

References 19 publications

Nanoimprint Lithography

Nanoimprint Lithography

Recent progress in direct patterning technologies based on nano-imprint lithography

Nanofabrication of Diamond-like Carbon Templates for Nanoimprint Lithography

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