“…While the higher PL yield after ZnO deposition is solely related to a higher excitation flux, the deposition of Al was shown to result in a higher quasi-Fermi level splitting with improved back-interface properties. The statistics of the interface defects is taken to follow the well-established statistics developed for dangling bonds in a-Si:H which takes into account the three charge states positive, neutral and negative [15,16]. Thus, the defect density at an energy (E) is the sum of the densities in the different charge densities can be derived [15,16].…”