2006
DOI: 10.1088/0268-1242/22/2/010
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Static NMOS circuits for crossbar architectures using silicon nano-wire technology

Abstract: This study shows the design and analysis of static NMOS gates composed of silicon nano-wire surrounding gate pull-down NMOSFETs (SGFETs) and p-type pull-up resistors as the primary building blocks to form high density circuits. The device geometry and doping concentration of NMOS transistors and p-type resistors are varied until the lowest noise margin and standby power dissipation are obtained for an inverter. The optimum NMOS transistor and p-type resistor configurations are subsequently used to build variou… Show more

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Cited by 7 publications
(2 citation statements)
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“…Specifically, there is no power consumed at 0 V input as a result of the "OFF" state of the driver; on the other hand, at 5 V input, the output current is the saturation current of the load at 0 V gate bias (∼0.8 A). As such, the static power dissipation is estimated to be as low as ∼4 W, which is comparable to the lowest NW NMOS reported values and far lower than their planar counterparts [60,61].…”
Section: Device Applications Of Iii-v Nwsmentioning
confidence: 66%
“…Specifically, there is no power consumed at 0 V input as a result of the "OFF" state of the driver; on the other hand, at 5 V input, the output current is the saturation current of the load at 0 V gate bias (∼0.8 A). As such, the static power dissipation is estimated to be as low as ∼4 W, which is comparable to the lowest NW NMOS reported values and far lower than their planar counterparts [60,61].…”
Section: Device Applications Of Iii-v Nwsmentioning
confidence: 66%
“…Specifically, there is no power consumed at 0 V input as a result of the “OFF” state of the driver; on the other hand, the output current at 5 V input is the saturation current of the load at 0 V gate bias (≈0.8 μA as shown in Figure S6, Supporting Information). As such, the static power dissipation is estimated to be as low as ≈4 μW, which is comparable to the lowest NW NMOS reported values and far lower than their planar counterparts 37, 38. Further performance enhancements can also be achieved with the optimized device geometry with a top‐gated structure for the smaller parasitic capacitance.…”
mentioning
confidence: 82%