Spatially resolved characterization of a dc magnetron plasma using optical emission spectroscopy

Abstract

In this work, a reactive argon−nitrogen Ar N 10 1 2 [ ( )] / dc magnetron plasma for sputtering of a chromium (Cr) target is characterized with high spatial resolution by optical emission spectroscopy (OES) using molecular nitrogen emission bands at 0.5 Pa and 100 W. Beside the global gas temperature T g , the electron temperature T e , electron density n e , and the steady-state Cr density n Cr are also determined spatially resolved using a movable OES setup inside the chamber and Abel inversion. n e and T e are found to be consistent with the values measured by a Langmuir probe (LP) within the non-magnetized region along the magnetron axis in a pure Ar plasma for the same process parameters. Finally, a nitrogen content c N of 4% in the target surface is found for the reactive plasma by matching the mean steady-state chromium density n Cr measured by OES and calculated from TRIDYN simulations.

Linking simulated polycrystalline thin film microstructures to physical vapor deposition conditions

“…The per-pixel atomic deposition rate is given by ρ𝑣 dep 𝛥𝐴, where ρ refers to the true typical atomic vapor density near the film surface rather than the dimensionless vapor density field variable 𝜌, and 𝛥𝐴 = 0.25 nm 2 is the exposed surface area of each pixel. Experimental values of ρ are ∼ 10 17 atoms/m 3 [28,29]. Assuming that 𝑣 dep ∼ ⟨𝑣 ⟂ ⟩ (on the order of 1000 m/s), the per-pixel deposition rate is precisely the value needed to obtain growth rates of 1 − 5 nm/s.…”

Determination of atomic oxygen state densities in a double inductively coupled plasma using optical emission and absorption spectroscopy and probe measurements

“…Oxygen containing plasma are widely used in industry for etching [1,2], cleaning [3], or layer deposition processes [4][5][6][7], but are also a topic in recent scientific developments, e.g. plasma sterilization [8][9][10].…”

Plasma-surface interactions

“…By using a synergistic approach combining experimental measurements and theoretical modelling, Trieschmann et al [16] show how improved understanding of the sputter and thin film deposition processes can be obtained in magnetron discharges. Optical emission spectroscopy characterisation of the sputtering process and plasma properties is presented by Ries et al [17] for a reactive argon-nitrogen (Ar/N 2 (10/1)) DC magnetron discharge for sputtering of a chromium target. Layes et al [18] experimentally study the connection between target poisoning and current waveforms in reactive high-power impulse magnetron sputtering of chromium.…”