2015
DOI: 10.1049/mnl.2014.0573
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Soft‐lithography of ordered block copolymer nanostructures

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Cited by 2 publications
(1 citation statement)
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“…Meanwhile, top-down fabrication is in principle a batch and CMOS-compatible process [24] and therefore holds the promise of volume manufacturing for SERS-chip applications [25]. Though current prototyping is usually achieved by electron-or ion-beam direct writing, top-down fabrication is supposed to be eventually scalable by involving replica processes such as nanoimprinting [26,27] or soft-lithography techniques [28,29].…”
Section: Introductionmentioning
confidence: 99%
“…Meanwhile, top-down fabrication is in principle a batch and CMOS-compatible process [24] and therefore holds the promise of volume manufacturing for SERS-chip applications [25]. Though current prototyping is usually achieved by electron-or ion-beam direct writing, top-down fabrication is supposed to be eventually scalable by involving replica processes such as nanoimprinting [26,27] or soft-lithography techniques [28,29].…”
Section: Introductionmentioning
confidence: 99%