Simulation and Mitigation of Pattern and Process Dependencies in Nanoimprint Lithography

Taylor, Hayden

doi:10.2494/photopolymer.24.47

Cited by 5 publications

(2 citation statements)

References 50 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Nanoimprint lithography (NIL) often exhibits strong, systematic pattern dependencies, whereby spatial variation of the size, shape and areal density of geometries leads to parasitic elastic deflections of the stamp during imprinting [1]. These stamp deflections result in variation of RLT or incomplete cavity filling.…”

Section: Introductionmentioning

confidence: 99%

“…Modeling and numerical simulation can accelerate the development of suitable designs and processes. There have been several attempts to develop simulation techniques for NIL [1], ranging from molecular dynamics, through finite-element approaches to coarse-grain models. We have previously developed and experimentally validated a computationally simple algorithm for the chip-and wafer-scale imprinting of thermoplastic polymers [2], [3].…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Fast Simulation of Pattern Formation and Process Dependencies in Roller Nanoimprint Lithography

Taylor

2013

MRS Proc.

View full text Add to dashboard Cite

We contribute a fast numerical approach to simulating the roller-imprinting of complex patterns. The technique predicts the extent to which imprinted patterns are fully formed, as well as variation of the imprinted material's residual layer thickness (RLT). The approach can be used for roll-to-roll and roll-to-plate configurations, and for rollers with or without elastomeric coatings. If patterns vary in pitch, shape or areal density across the roller, RLT and the completeness of pattern transfer can vary with position as well as with processing parameters, and our technique is able to model these effects. The technique has been successfully validated against published experimental data from two different roller-NIL processes: one involving an ultraviolet-curing resist film on a glass plate, and another involving a flexible thermoplastic web softened at its surface.

show abstract

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%