Silicon oxide diffusion barrier coatings on polypropylene

Körner, Lutz; Sonnenfeld, Axel; Rohr, Ph. Rudolf von

doi:10.1016/j.tsf.2010.02.006

Cited by 27 publications

(10 citation statements)

References 31 publications

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“…Apart from the very high performances obtained by Premkumar et al . from atmospheric pressure air or nitrogen discharges with argon and HMDSO or tetraethylorthosilicate (TEOS) admixtures, this value is in very good accordance with other values obtained for a silicalike monolayer deposited by low-pressure PECVD, ,− showing the good quality of the layers deposited in this work.…”

Section: Resultssupporting

confidence: 89%

Organosilicon Coatings Deposited in Atmospheric Pressure Townsend Discharge for Gas Barrier Purpose: Effect of Substrate Temperature on Structure and Properties

Petersen

Bardon²,

Dinia

et al. 2012

ACS Appl. Mater. Interfaces

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Organosilicon plasma polymer and silicalike layers are deposited at different temperatures in a dielectric barrier discharge at atmospheric pressure operating in the Townsend regime. Final properties of these two kinds of layers can be finely tuned by the plasma process conditions. In particular, influence of deposition temperature is investigated when hexamethyldisiloxane based monolayers are deposited on poly(ethylene naphtalate) substrate. Coating chemical structure is tested by means of Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy. Their thickness, topography, and mechanical properties are evaluated by ellipsometry, scanning electron microscopy observation of coatings cross sections, atomic force microscopy, and nanoscratch testing. Permeability of coated polymer is measured for transparent silicalike layers, and the effect of coating structure on the oxygen gas permeability is discussed. The deposition temperature of coatings at 90 °C provides a strong improvement in barrier property compared to room temperature deposition, thanks to a densification of the SiO₂ matrix and to a decrease in the silanol group content.

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Section: Resultssupporting

confidence: 89%

Organosilicon Coatings Deposited in Atmospheric Pressure Townsend Discharge for Gas Barrier Purpose: Effect of Substrate Temperature on Structure and Properties

Petersen

Bardon²,

Dinia

et al. 2012

ACS Appl. Mater. Interfaces

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“…The deposition of inorganic coating with the plasma enhanced technique is addressed as PECVD. As is well known, nano-sized amorphous SiO x coatings with the main advantages of optical transparency, recyclability, and suitability for MW heating have been deposited onto the polymer for excellent diffusion barrier performance [70][71][72]. The normal deposition technologies for SiO x films are based on PVD and sol-gel technique.…”

Section: Plasma Enhanced Chemical Vapor Deposition (Pecvd) and Plasmamentioning

confidence: 99%

Recent progress on non-thermal plasma technology for high barrier layer fabrication

Sang

Wang

Liu

et al. 2018

Plasma Sci. Technol.

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This review describes the application of non-thermal plasma (NTP) technology for high barrier layer fabrication in packaging area. NTP technology is considered to be the most prospective approaches for the barrier layer fabrication over the past decades due to unpollution, high speed, low-costing. The applications of NTP technology have achieved numerous exciting results in high barrier packaging area. Now it seemly demands a detailed review to summarize the past works and direct the future developments. This review focuses on the different NTP resources applied in the high barrier area, the role of plasma surface modification on packaging film surface properties, and the deposition of different barrier coatings based on NTP technology. In particular, this review emphasizes the cutting-edge technologies of NTP on interlayer deposition with organic, inorganic for multilayer barriers fabrication. The future prospects of NTP technology in high barrier film areas are also described.

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“…PP polymers exhibit poor gas barrier properties due to poor molecular structure of polyolefins (CH 2 = CHR), which increases oxygen permeability and water vapour permeability of PP films [6,9,10]. There is a trend in utilizing the barrier properties of packaging films are improved with the help of nanocomposite material depositing on packaging films [11][12][13][14][15].…”

Section: Introductionmentioning

confidence: 99%

Development of High Oxygen Barrier Multi-layered Packaging Film for Shelf Life Extension of Ready-to-Cook (RTC) Idli Batter

Gaikwad

Yadav

Loganathan

et al. 2020

IRJPAC

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Aim:The current study focuses on development of high oxygen barrier multi-layered packaging film for shelf life extension of Ready-to-Cook (RTC) idli batter. Place and Duration of Study: Department of Food Packaging and System Development at IndianInstitute of Food Processing Technology, Thanjavur, Tamil Nadu, India, between Aug 2018 and Dec 2019. Methodology: The developed multi-layered film composed with polypropylene (PP) nanocomposite by depositing silicon dioxide (SiO 2 ) on PP (0.010 mm) film and attached with different thickness of barrier layers were PP (0.010-0.053 mm) and ethylene-vinyl alcohol (EVOH 32%) film (0.066 mm) using layer-by-layer (LbL) process. The physical and chemical characteristics of commercial (A) and all developed multi-layered (B, C, D, E and F) films were tested for barrier and mechanical properties. Gaikwad et al.; IRJPAC, 21(1): 13-27, 2020; Article no.IRJPAC.54882 14 Results and Discussion: The SEM analysis confirmed that the developed PP nanocomposite multi-layered films have a presence of SiO 2 with quasi-spherical structure with diameter ranging from 200 to 500 nm. FTIR analysis also identified the presence of Si-O-Si group on all the developed PP nanocomposite films at wavenumber ranges from 1100-900 cm -1 and 467 cm -1 . The film composed with PP++SiO 2 +EVOH (sample F) showed lower in oxygen transmission rate (OTR) of 452.46±33.94 cc/m 2 /24h and water vapour transmission rate (WVTR) of 1.07±0.16 g/m 2 day. The batter stored in sample F film help to extend the shelf life upto 33 h at ambient temperature and commercially stored batter spoiled quickly (24 h) at ambient temperature. Original Research Article

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Silicon oxide diffusion barrier coatings on polypropylene

Cited by 27 publications

References 31 publications

Organosilicon Coatings Deposited in Atmospheric Pressure Townsend Discharge for Gas Barrier Purpose: Effect of Substrate Temperature on Structure and Properties

Organosilicon Coatings Deposited in Atmospheric Pressure Townsend Discharge for Gas Barrier Purpose: Effect of Substrate Temperature on Structure and Properties

Recent progress on non-thermal plasma technology for high barrier layer fabrication

Development of High Oxygen Barrier Multi-layered Packaging Film for Shelf Life Extension of Ready-to-Cook (RTC) Idli Batter

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