“…Currently, researchers have been using various chemical and physical deposition methods, such as molecular beam epitaxy (MBE) [23,24], chemical vapor [25], hydrothermal [26], radiofrequency sputtering [27], slurry coating [28], non-injection one-pot [29], silicon isolation layer [30], electrodeposition [31], and chemical bath deposition (CBD) [32], to develop ternary CdSe 0.6 Te 0.4 thin films for various applications. Among these methods, the electrodeposition method is simple, rapid, and scalable for preparing ternary CdSe 0.6 Te 0.4 samples [31][32][33][34][35][36][37].…”