Shear-Aligned Block Copolymer Thin Films as Nanofabrication Templates

Register, Richard A.; Angelescu, Dan; Pelletier, Vincent; Asakawa, Koji; Wu, Mingshaw; Adamson, Douglas H.; Chaikin, P. M.

doi:10.2494/photopolymer.20.493

Cited by 5 publications

(4 citation statements)

References 11 publications

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“…In most cases, the patterns were aligned in one direction, which may have been caused by shear during clamping. 15,51 Similar alignment effects were also observed for 52K-52K PS-b-PMMA films with a thickness of 1.0 L o and 1.5 L o sandwiched between two PS-r-PMMA (58%S) modified substrates (see Supporting Information, Figure S2).…”

Section: Resultssupporting

confidence: 68%

“…The composition window (44.6 < %S < 57.0) for perpendicular orientation of domains confined between two brushes was similar to the window determined from both SEM and GISAXS measurements. In most cases, the patterns were aligned in one direction, which may have been caused by shear during clamping. , Similar alignment effects were also observed for 52K−52K PS- b -PMMA films with a thickness of 1.0 L o and 1.5 L o sandwiched between two PS- r -PMMA (58%S) modified substrates (see Supporting Information, Figure S2).…”

Section: Resultssupporting

confidence: 63%

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Generalization of the Use of Random Copolymers To Control the Wetting Behavior of Block Copolymer Films

et al. 2008

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Random copolymer brushes of poly(styrene-r-methyl methacrylate) (PS-r-PMMA) have previously been used to control the wetting behavior of poly(styrene-b-methyl methacrylate) (PS-b-PMMA) block copolymer.Here we demonstrate that the use of random copolymer may be generalized to other block copolymer systems. A series of poly(styrene-r-2-vinylpyridine-r-hydroxyethyl methacrylate) (PS-r-P2VP-r-PHEMA) random copolymers was synthesized and evaluated as brush layers to control the orientation of domains in thin films of poly(styrene-b-2-vinylpyridine) (PS-b-P2VP) block copolymer. On nonpreferential brushes, thin films of PS-b-P2VP had a mixed orientation of domains consisting of a perpendicular orientation of lamellar domains near the copolymer-substrate interface and a parallel orientation of lamellar domains at free surface because of the lower surface energy of the PS block. The composition window of brushes that induce vertical orientation of domains near the substrate ranges from 47.8% styrene to 57.0% styrene, as determined by SEM and GISAXS measurements of films after removal of the parallel-oriented domains at surfaces (remaining film thickness ≈ 50 nm). When the PS-b-P2VP film was confined between two brushes having compositions within the above range, perpendicularoriented lamellae that traversed the film thickness were obtained.

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Section: Resultssupporting

confidence: 68%

Section: Resultssupporting

confidence: 63%

Generalization of the Use of Random Copolymers To Control the Wetting Behavior of Block Copolymer Films

et al. 2008

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“…A number of methods have been used to shear align BCP thin films including physically moving an elastomer or an atomic force microscopy (AFM) tip across the film surface; from the thermal expansion and contraction of a contacting elastomer in a temperature gradient; and through the dewetting of a polymer top‐coat during thermal annealing, which generates a shear field that aligns the underlying BCP cylinders in a starburst pattern . In this last case, micro‐patterning the top‐coat induces a controlled dewetting direction and therefore the shear direction could be controlled.…”

Section: Introductionmentioning

confidence: 99%

Facile non‐lithographic route to highly aligned silica nanopatterns using unidirectionally aligned polystyrene‐block‐polydimethylsiloxane films

Qiang

Wadley

Vogt

et al. 2015

J Polym Sci B Polym Phys

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Thin films (monolayer and bilayer) of cylinder forming polystyrene-block-polydimethylsiloxane (PS-b-PDMS) were shear aligned by the swelling and deswelling of a crosslinked PDMS pad that was physically adhered to the film during solvent vapor annealing. The nanostructures formed by selfassembly were exposed to ultraviolet-ozone to partially oxidize the PDMS, followed by calcination in air at 500 8C. In this process, the PS segments were fully decomposed, while the PDMS yielded silica nanostructures. The highly aligned PDMS cylinders were thus deposited as silica nanolines on the silicon substrate. Using a bilayer film, the center-to-center distance of these features were effectively halved from 38 to 19 nm. Similarly, by sequential shear-alignment of two distinct layers, a rhombic array of silica nanolines was fabricated. This methodology provides a facile route to fabricating complex topographically patterned nanostructures.

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“…To obtain such dimension on a large area at low cost, we are developing a process based on the transfer by DRIE of 30-nm line patterns made of di-block copolymers [ 4 ]. For this purpose, it is required to characterize them to the best possible degree of accuracy.…”

Section: Introductionmentioning

confidence: 99%

Thermal conductivity and thermal boundary resistance of nanostructures

et al. 2011

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We present a fabrication process of low-cost superlattices and simulations related with the heat dissipation on them. The influence of the interfacial roughness on the thermal conductivity of semiconductor/semiconductor superlattices was studied by equilibrium and non-equilibrium molecular dynamics and on the Kapitza resistance of superlattice's interfaces by equilibrium molecular dynamics. The non-equilibrium method was the tool used for the prediction of the Kapitza resistance for a binary semiconductor/metal system. Physical explanations are provided for rationalizing the simulation results.PACS68.65.Cd, 66.70.Df, 81.16.-c, 65.80.-g, 31.12.xv

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Shear-Aligned Block Copolymer Thin Films as Nanofabrication Templates

Cited by 5 publications

References 11 publications

Generalization of the Use of Random Copolymers To Control the Wetting Behavior of Block Copolymer Films

Generalization of the Use of Random Copolymers To Control the Wetting Behavior of Block Copolymer Films

Facile non‐lithographic route to highly aligned silica nanopatterns using unidirectionally aligned polystyrene‐block‐polydimethylsiloxane films

Thermal conductivity and thermal boundary resistance of nanostructures

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