Sharp transition from ripple patterns to a flat surface for ion beam erosion of Si with simultaneous co-deposition of iron

Zhang, K.; Brötzmann, Marc; Hofsäß, H.

doi:10.1063/1.4739843

Cited by 27 publications

(35 citation statements)

References 24 publications

(37 reference statements)

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“…In particular the comparison of Cu versus Fe and Ni co-deposition as well as Au versus Pt and W co-deposition clearly demonstrates the important role of the chemical effects of the pattern formation, because the collision cascade effects of the two groups of elements are quite comparable. Phase separation is also supported by the observation that the surface remains flat when the Fe concentration in the Fe-Si surface layer reaches the FeSi 2 stoichiometry [27].…”

Section: Introductionmentioning

confidence: 75%

“…This scenario proposes ion-induced phase separation towards a metal silicide phase embedded in a Si matrix as the relevant mechanism. Indeed, the formation of amorphous Fe silicides was experimentally verified by XPS measurements [27]. Ion enhanced phase separation was also recently proposed to explain pattern formation on Si for oblique 40-keV Ar ion erosion and Fe co-deposition [28], and for 2 keV Kr irradiation of Si and simultaneous Fe co-deposition at 660 K [29].…”

Section: Introductionmentioning

confidence: 83%

“…FeSi 2 , MoSi 2 ) or mono-silicide (e.g. PtSi) phases, pronounced dot and ripple patterns are created and ion-induced phase separation is seen as the driving mechanism for pattern formation [23,27]. In contrast, co-deposition during ion irradiation of Au or Cu, elements which either do not form silicides at all or only very metal-rich silicide phases, the surface remains flat.…”

Section: Introductionmentioning

confidence: 99%

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Designing self-organized nanopatterns on Si by ion irradiation and metal co-deposition

2014

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Dot and ripple nanopatterns on Si surfaces with defined symmetry and characteristic dot spacings of 50-70 nm were created by 1 keV Ar ion irradiation at normal incidence and simultaneous co-deposition of Fe atoms at grazing incidence. Fe was continuously supplied from different sputter targets surrounding the Si substrate, leading to a steady-state Fe content in the near-surface region of the substrates. The pattern formation is self-organized, most probably caused by ion-induced phase separation. Patterns were analyzed with atomic force microscopy and the Fe content in the irradiated layer was measured with Rutherford backscattering. The symmetries of the produced patterns are isotropic, four-fold symmetric, three-fold symmetric and various types of two-fold symmetric patterns, depending on the geometrical arrangement of the sputter targets. Pattern formation was studied for a steady-state coverage of Fe between 0.5 and 3.3 × 10 15 Fe cm −2 . The threshold coverage for the onset of pattern formation is about 0.5-1 × 10 15 Fe cm −2 . The coherence length of the patterns is comparable to the average dot spacing. Nevertheless, the autocorrelation analysis reveals a residual long-range periodicity of some patterns. The dot spacing can be adjusted between about 20 nm and several hundred nm depending on the ion species and ion energy.

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Section: Introductionmentioning

confidence: 75%

Section: Introductionmentioning

confidence: 83%

Section: Introductionmentioning

confidence: 99%

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Designing self-organized nanopatterns on Si by ion irradiation and metal co-deposition

2014

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“…In particular, the micrographs displayed in Figures 1, 2 and 3 were obtained from bombarded samples without masking them. This comment is important because, as reported by Zhang et al [28], bombarding Si with Xe + ions under simultaneously co-depositing Fe, modify the generated type of pattern. As pointed out in the introduction, the effect of the texture, strain, and defects on the nitriding process studied in DOI: http://dx.doi.org/10.1016/j.matchemphys.2014.10.015 11 this paper are an average phenomenon observed over many grains.…”

Section: Perpendicular Bombarding Effect On the Nitrided Materials Promentioning

confidence: 85%

Effect of bombarding steel with Xe+ ions on the surface nanostructure and on pulsed plasma nitriding process

Cucatti

Ochoa

Morales

et al. 2015

Materials Chemistry and Physics

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The modification of steel (AISI 316L and AISI 4140) surface morphology and underlying inter-crystalline grains strain due to Xe + ion bombardment are reported to affect nitrogen diffusion after a pulsed plasma nitriding process. The ion bombardment induces regular nanometric patterns and increases the roughness of the material surface. The strain induced by the noble gas bombardment is observed in depths which are orders of magnitude larger than the projectiles' stopping distance. The pre-bombarded samples show peculiar microstructures formed in the nitrided layers, modifying the in-depth hardness profile. Unlike the double nitrided layer normally obtained in austenitic stainless steel by pulsed plasma nitriding process, the Xe + pre-bombardment treatment leads to a single thick compact layer. In nitrided pre-bombarded AISI 4140 steel, the diffusion zone shows long iron nitride needleshaped precipitates, while in non-pre-bombarded samples finer precipitates are distributed in the material. Keywords: Surface modification, ion-beam bombardment, plasma nitriding, microstrain S. Cucatti et al., Materials Chemistry and Physics, Volumes 149-150, (2015), pp. 261-269 DOI http://dx.doi.org/10.1016/j.matchemphys.2014.10.015 DOI: http://dx.doi.org/10.1016/j.matchemphys.2014.10.015 2 IntroductionSurface texturing is an important method applied in various technological areas of research. Much of the current interest in surface modifications stems from the possibility of obtaining special optical, tribological, and mechanical properties in a variety of materials [1,2]. In particular, texturing steels surface by ionic bombardment (atomic attrition) is an interesting route to modify plasma nitriding processes. The efficiency of the process and the final material properties are influenced by modifications of the surface and bulk material such as roughness, defects, and stress created by ion impact. Moreover, a combination of low energy argon ion bombardment and substrate temperature modified diffusion phenomena in semiconductors [3]. Other surface modifications such as mechanical attrition ("shot-penning") generate stress, plastic deformation, defects and roughness. All these changes contribute to modify the kinetic of the surface reactions, shortening the duration of nitriding processes [4,5,6]. Results reported by Abrasonis et al. suggest that the effect of bombarding the material with Ar + ions after nitriding processes also has important consequences on nitrogen diffusion in austenitic stainless steel [7]. The observed changes in plasma nitriding processes are attributed to several concomitant causes such as increasing the surface roughness, stress, and creation of lattice defects, altogether improving nitrogen diffusion [8,9]. Moreover, in the nitriding process, precipitation kinetics lead to possibly complex stress profiles even considering smoothly decreasing nitrogen profiles influencing nitrogen diffusion [10].In this work we expand the study reported by Ochoa et al. [8,9] by considering the state of the bombard...

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“…Ion beam parameters (species, incidence angle, energy, flux, etc) and substrate parameters (material, temperature, initial surface topography, etc) interact to generate the features of such nanopatterns. Recently, numerous experiments on sputtering with simultaneous co-deposition [20][21][22][23][24][25][26][27][28][29][30][31][32][33][34][35][36][37][38][39] and theoretical studies [40][41][42][43][44][45][46][47] on simultaneous metal co-deposition during IBS or surfactant sputtering [32-38, 46, 47] have been performed to elucidate the formation mechanism of self-organized nanostructures and to generate various nanopatterns. In principle, the simultaneous use of metal atoms modulates the sputtering yield of the substrate during IBS, which results in diverse physical and chemical phenomena (e.g., island formation or phase separation).…”

Section: Introductionmentioning

confidence: 99%

Nanostructures on fused silica surfaces produced by ion beam sputtering with Al co-deposition

et al. 2017

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The ion beam sputtering (IBS) of smooth mono-elemental Si with impurity co-deposition is extended to a pre-rippled binary compound surface of fused silica (SiO 2 ). The dependence of the rms roughness and the deposited amount of Al on the distance from the Al source under Ar + IBS with Al co-deposition was investigated on smooth SiO 2 , pre-rippled SiO 2 , and smooth Si surfaces, using atomic force microscopy and X-ray photoelectron spectroscopy. Although the amounts of Al deposited on these three surfaces all decreased with increasing distance from the Al target, the morphology and rms roughness of the smooth Si surface did not demonstrate a strong distance dependence. In contrast to smooth Si, the rms roughness of both the smooth and pre-rippled SiO 2 surfaces exhibited a similar distance evolution trend of increasing, decreasing, and final stabilization at the distance where the results were similar to those obtained without Al co-deposition. However, the pre-rippled SiO 2 surfaces showed a stronger modulation of rms roughness than the smooth surfaces. At the incidence angles of 60° and 70°, dot-decorated ripples and roof-tiles were formed on the smooth SiO 2 surfaces, respectively, whereas nanostructures of closely aligned grains and blazed facets were generated on the pre-rippled SiO 2 , respectively. The combination of impurity co-deposition with pre-rippled surfaces was found to facilitate the formation of novel types of nanostructures and morphological growth. The initial ripples act as a template to guide the preferential deposition of Al on the tops of the ripples or the ripple sides facing the Al wedge, but not in the valleys between the ripples, leading to 2D grains and quasiblazed grating, which offer significant promise in optical applications. The rms roughness enhancement is attributed not to AlSi, but to AlO x F y compounds originating mainly from the Al source.

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Sharp transition from ripple patterns to a flat surface for ion beam erosion of Si with simultaneous co-deposition of iron

Cited by 27 publications

References 24 publications

Designing self-organized nanopatterns on Si by ion irradiation and metal co-deposition

Designing self-organized nanopatterns on Si by ion irradiation and metal co-deposition

Effect of bombarding steel with Xe+ ions on the surface nanostructure and on pulsed plasma nitriding process

Nanostructures on fused silica surfaces produced by ion beam sputtering with Al co-deposition

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