2019
DOI: 10.1002/adfm.201807613
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Shallow and Undoped Germanium Quantum Wells: A Playground for Spin and Hybrid Quantum Technology

Abstract: Buried-channel semiconductor heterostructures are an archetype material platform for the fabrication of gated semiconductor quantum devices. Sharp confinement potential is obtained by positioning the channel near the surface; however, nearby surface states degrade the electrical properties of the starting material. Here, a 2D hole gas of high mobility (5 × 10 5 cm 2 V −1 s −1 ) is demonstrated in a very shallow strained germanium (Ge) channel, which is located only 22 nm below the surface. The top-gate of a do… Show more

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Cited by 122 publications
(149 citation statements)
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References 49 publications
(87 reference statements)
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“…The α values confirm that the mobility is limited by scattering from the dielectric/semiconductor interface, as previously observed in Si/SiGe and Ge/SiGe H-FETs. [10,24,29,30] Despite the close proximity to the dielectric interface, the shallower quantum well has a remarkable peak mobility of 1.64 × 10 5 cm 2 /Vs at p = 1.05 × 10 12 cm −2 , 2.4× larger than previous reports for quantum wells positioned at a similar distance from the surface. [24] At higher density the mobility starts to drop, possibly due to occupation of the second subband or to different scattering mechanisms becoming dominant.…”
mentioning
confidence: 86%
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“…The α values confirm that the mobility is limited by scattering from the dielectric/semiconductor interface, as previously observed in Si/SiGe and Ge/SiGe H-FETs. [10,24,29,30] Despite the close proximity to the dielectric interface, the shallower quantum well has a remarkable peak mobility of 1.64 × 10 5 cm 2 /Vs at p = 1.05 × 10 12 cm −2 , 2.4× larger than previous reports for quantum wells positioned at a similar distance from the surface. [24] At higher density the mobility starts to drop, possibly due to occupation of the second subband or to different scattering mechanisms becoming dominant.…”
mentioning
confidence: 86%
“…Details of the heterostructure growth, device fabrication and operation, and magnetotransport measurements are reported in Ref. [10]. Figure 1(a) shows scanning transmission electron microscopy with energy dispersive X-ray (STEM-EDX) analysis of the shallow Ge quantum well (t = 12 nm) under the gate stack.…”
mentioning
confidence: 99%
“…[ 9 ] Different material combinations ranging from II–VI to IV–IV have been widely used. Among them, Ge is attracting more and more attention due to its high hole mobility, [ 10–13 ] low effective mass in 2D hole gases, [ 14,15 ] good contacts with metals, [ 16–18 ] strong spin–orbit interactions, [ 19–22 ] capability of isotopic purification, [ 23 ] and compatibility with Si. These attractive features make Ge a promising candidate not only as a transistor channel material but also as a host for spin [ 6,24,25 ] and even topological qubits.…”
Section: Figurementioning
confidence: 99%
“…Fabrication is based on silicon substrates and standard manufacturing materials. We grow strained germanium quantum wells, measured to have high hole mobilities µ > 500.000 cm 2 /Vs and a low effective hole mass m h = 0.09 m e [22,24], and predicted to reach m h = 0.05 m e at zero density [25,26]. This allows us to define quantum dots of comparatively large size and we find excellent control over the exchange interaction between the two dots.…”
mentioning
confidence: 99%