The advantages of surface‐imaging photoresist processes have been well documented; it has shown to have greater resolution, wider focus budget, and less sensitivity to topography and reflections from the substrate. The DESIRE process (Diffusion Enhanced Silylated Resist) is a good example of a surface‐imaging process. In previous papers we have described the characterization of this process in a lab environment, discussed some of the issues involved in the implementation of this process in a manufact…
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