2004
DOI: 10.1109/jqe.2003.821539
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Scanning Voltage Microscopy on Buried Heterostructure Multiquantum-Well Lasers: Identification of a Diode Current Leakage Path

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Cited by 13 publications
(12 citation statements)
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“…74 Figure 26 shows a schematic diagram of the transverse cross-section of the BH laser and the possible leakage current paths. 75 Investigations based on a simplified equivalent electrical circuit calculation show that the connection width (W c ), as defined in Figure 26, plays a key role in determining the current leakage. 73 Depletion regions between p-and n-doped InP layers near the active region-thyristor interface are crucial in funneling current into the active region.…”
Section: Buried Heterostructure Breakdownmentioning
confidence: 99%
See 1 more Smart Citation
“…74 Figure 26 shows a schematic diagram of the transverse cross-section of the BH laser and the possible leakage current paths. 75 Investigations based on a simplified equivalent electrical circuit calculation show that the connection width (W c ), as defined in Figure 26, plays a key role in determining the current leakage. 73 Depletion regions between p-and n-doped InP layers near the active region-thyristor interface are crucial in funneling current into the active region.…”
Section: Buried Heterostructure Breakdownmentioning
confidence: 99%
“…72,82 SVM is a failure analysis tool, able to pinpoint causes of device failure. 75 reverse engineering tool, illuminating device structure and active behavior. 14,24 SVM is a development tool, used in conjunction with other analysis techniques such as SDSRM.…”
Section: Summary and Comparisonmentioning
confidence: 99%
“…Scanning voltage microscopy (SVM) was therefore performed on the BH laser. Details of the experimental setup and measurement can be found in Ref [33,34]. Fig.6 shows a 2D voltage profile acquired under a dc forward bias of 0.845 V, which results in a current of 10.55 mA (above lasing threshold).…”
Section: Resultsmentioning
confidence: 99%
“…SVM, also called nanopotentiometry, is the most advanced technique of the AFM‐based methods that can directly measure the voltage change or electric field distribution from the cross‐section of a fully operating nanodevice with high spatial resolution (Ban et al ., ,b; Trenkler et al ., ). In this SVM measurement technique, the device needs to be operating with bias applied directly to the device and current–voltage (IV) can also be measured.…”
Section: Introductionmentioning
confidence: 99%
“…This is a nanoscopic probing measurement in which the AFM probe measures the potential of each data point inside a given semiconductor resulting in internal potential distribution as a form of voltage mapping of the scanned area. From this mapping the local potential properties, such as electric field distribution due to dynamic carriers, in the semiconductor device is acquired without destroying the operating device (Ban et al ., ; Ban et al ., ,b; Dhar et al ., ,b). SVM has been successfully used to image the quantum structures on the nanometer scale device and also to resolve and measure inner workings such as voltage profiles, electric fields and their carrier distribution and in some instances also estimate the dynamic carrier concentration in operating III–V material‐based nanodevices (Ban et al ., ,b; Dhar et al ., ,b; Dhar et al ., ).…”
Section: Introductionmentioning
confidence: 99%