Scanning Probe Lithography Using Self-Assembled Monolayers

Abstract

Contents 1. Introduction 4367 2. Elimination Lithography 4369 2.1. STM Modification under Ambient Conditions 4370 2.2. STM Modification in UHV 4372 2.3. Modification with AFM (Mechanical and Electrical) 4374 2.4. Scanning Probe Lithography with SECM 4380 2.5. Scanning Probe Lithography with NSOM 4380 3. Addition Lithography 4384 3.1. Historical Precedent for Addition Lithography 4384 3.2. Fundamentals of DPN 4384 3.3. Variation of the Ink and Substrate 4388 3.4. DPN Structures as Templates 4391 3.5. Mechanistic Aspects underlying DPN 4393 4. Substitution Lithography 4397 4.1. Substitution Initiated by Removal of SAM under Elevated Bias 4398 4.2. Substitution Initiated by Removal of SAM via Mechanical Desorption 4401 4.3. Substitution Followed by ex-Situ Addition to Patterns 4404 4.4. Substitution via Tip-Induced Terminal Group Modification 4406 5. Conclusions and Outlook 4413 6. Acknowledgments 4414 7. Glossary 4414 8. References 4415

Investigation of Localized Catalytic and Electrocatalytic Processes and Corrosion Reactions with Scanning Electrochemical Microscopy (SECM)

“…Because the various near-field interactions act simultaneously, it can be difficult to assign experimental observation to only one mechanism. A detailed discussion must therefore consider many different cases [131].…”

Multidimensional electrochemical imaging in materials science

“…This is commonly used in AFM as a method for estimating the thickness of a molecular film and for surface microlithography [290,291]. The review by Kraemer et al [291] is an endless resource of work done in this field.…”

“…This is commonly used in AFM as a method for estimating the thickness of a molecular film and for surface microlithography [290,291]. The review by Kraemer et al [291] is an endless resource of work done in this field. Briefly, the manipulation of individual alkanethiolate and functionalized silane molecules by STM, C-AFM, and SECM [71,[292][293][294][295][296][297] is mainly based on regeneration of a gold surface either by electrochemically initiated removal of the chemisorbed thiolate from the gold surface (Eq.…”

Morphology of nanoimprinted polyimide films fabricated via a controlled thermal history

“…9 Electron-beam lithography and scanning-probe nanolithography are often utilized to generate very small features, but their development into practical commercial methods for low-cost, high-volume processing still requires great ingenuity. 10,11 Surface-modified lithography may contaminate the sample and limit the selectivity between the polymer and self-assembled monolayer. 12 Nanoimprint lithography (NIL), which is convenient, effective and of low cost, has been demonstrated to be one of the promising approaches for the fabrication of high-quality polymer micro/nanostructures.…”