2002
DOI: 10.1063/1.1504880
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Scaling quantum-dot light-emitting diodes to submicrometer sizes

Abstract: We introduce a device structure and a fabrication technique that allow the realization of efficient light-emitting diodes (LEDs) with dimensions of the active area in the ≈100 nm range. Using optical lithography, selective oxidation, and an active region consisting of InAs quantum dots (QDs), we fabricated LEDs with light–current–voltage characteristics which scale well with nominal device area down to 600 nm diam at room temperature. The scaling behavior provides evidence for strong carrier confinement in the… Show more

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Cited by 45 publications
(44 citation statements)
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“…First, two emission lines dominate the spectrum: the exciton (X) and biexciton (BX). As previously demonstrated [4][5][6][7][8][9], the identification follows from the power dependence of the integrated PL intensity. On average the exciton intensity is proportional to P 0.7±0.1 and the BX to P…”
Section: Resultsmentioning
confidence: 95%
“…First, two emission lines dominate the spectrum: the exciton (X) and biexciton (BX). As previously demonstrated [4][5][6][7][8][9], the identification follows from the power dependence of the integrated PL intensity. On average the exciton intensity is proportional to P 0.7±0.1 and the BX to P…”
Section: Resultsmentioning
confidence: 95%
“…As shown in Ref. 12, we expect current spreading and carrier diffusion to be negligible in this structure. Despite a high turn-on voltage (due to unoptimized p-doping in the top mirror), all curves can be fitted with a single oxidized length parameter that is also consistent with the SEM estimate.…”
mentioning
confidence: 95%
“…The QD LEDs are designed to be efficient devices only for the one or few QDs that are resonant with the cavity mode: the ultimate goal is to demonstrate enhancement of spontaneous emission from a single emitter which requires high quality factors and small mode volumes. Optimization of these parameters compromises the efficiency 12 for the QD ensemble. The cw electroluminescence spectra at 293 K are presented in logarithmic scale in Fig.…”
mentioning
confidence: 99%
“…Selective oxidation of the AlGaAs cladding layers, which has been extensively used in optoelectronic device fabrication, [12][13][14][15][16][17][18] was investigated here as a means to reduce the influence of the surface by reducing carrier diffusion to the etched surfaces. Some of the samples were placed in an oxidation furnace after the etch step to selectively oxidize the Al 0.9 Ga 0.1 As layers.…”
Section: Design and Fabricationmentioning
confidence: 99%