2018
Scalable Fabrication of Stable High Efficiency Perovskite Solar Cells and Modules Utilizing Room Temperature Sputtered SnO2 Electron Transport Layer
Abstract: Stability and scalability have become the two main challenges for perovskite solar cells (PSCs) with the research focus in the field advancing toward commercialization. One of the prerequisites to solve these challenges is to develop a cost-effective, uniform, and high quality electron transport layer that is compatible with stable PSCs. Sputtering deposition is widely employed for large area deposition of high quality thin films in the industry. Here the composition, structure, and electronic properties of ro…
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Cited by 176 publications
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“…For the SnO 2 films produced by CBD and spin coating of colloidal sols or sol–gel solutions, the reported optimum thicknesses are in the range of 30–50 nm, 30–39,44–46 and the sputter-deposited SnO 2 films are reported to have an optimal thickness of 17–40 nm. 54–57 We believe that the relatively thinner optimal thickness in our study is attributed to the better step coverage and higher uniformity of the SnO 2 films produced by our two-step deposition method.…”
Section: Resultsmentioning
confidence: 74%
“…For the SnO 2 films produced by CBD and spin coating of colloidal sols or sol–gel solutions, the reported optimum thicknesses are in the range of 30–50 nm, 30–39,44–46 and the sputter-deposited SnO 2 films are reported to have an optimal thickness of 17–40 nm. 54–57 We believe that the relatively thinner optimal thickness in our study is attributed to the better step coverage and higher uniformity of the SnO 2 films produced by our two-step deposition method.…”
Section: Resultsmentioning
confidence: 74%
“…Replacement of TiO 2 by the SnO 2 layer can solve the issue from several points of view. First of all, as was shown by Qiu et al [15], that SnO 2 shows ten times higher conductivity (1.7×10 −3 S cm −1 ) than TiO 2 (10 −4 S cm −1 ). Secondly, the laser ablation of SnO 2 on top of TCO is easier than ablation of TiO 2 .…”
mentioning
confidence: 60%
“…Since SnO 2 is an n-type semiconductor, using only Ar as the working gas during the sputtering process can easily generate a large number of oxygen vacancies, which can even lead to Sn 2+ becoming the main component in the film, affecting the band structure and electrical properties of the sp-SnO 2 film. Therefore, it is usually necessary to introduce a certain amount of O 2 into the sputtering working gas to improve the film quality. , We find that as the O 2 content (determined by the partial pressure) increases from 50 to 100%, the electron mobility of the sp-SnO 2 film measured by space-charge-limited-current (SCLC) measurements increases from 4.92 × 10 –4 cm 2 V –1 s –1 to 6.77 × 10 –4 cm 2 V –1 s –1 , indicating a reduction in internal defects of the sp-SnO 2 film and an improvement in the crystal quality (Figure a). This higher electron mobility is conducive to separating and extracting electrons from the perovskite layer.…”
Section: Resultsmentioning
confidence: 91%
