A new class of interface growth models is proposed, where global equilibration of the driving force is achieved between each local deposition. Two such models are studied numerically, and it is seen that roughness can occur with higher exponents than in situations where global equilibration of the driving force is not established. In particular, we have found a new universality class of growth models which in one dimension gives self-affine interfaces with roughness exponent x = 0-63 it 0.02. PACS numbers: 68.35.Fx, 05.70.Ln, 47.55.Mh, 68.45.Gd There has recently been much interest in nonequilibrium growth models and their dynamic universality classes. These studies may have a number of practical applications, e.g., in chemical vapor deposition [1], electrochemical deposition [2], molecular beam epitaxy [3], growth of bacteria colonies [4], and in fluid invasion of porous media [5][6][7]. Theoretical studies have fallen into two classes. The first one treats nonlocal growth, appearing, e.g., in Laplacian growth phenomena, as diffusion limited aggregation. In these the growth at a point is influenced by the overall shape of the interface through screening of the driving force, and the evolving surfaces typically become self-similar. In nonlocal growth models there is also the invasion percolation where the segments of the interface with overall minimum resistance always propagate [8]. The other class of models treats growth that is governed completely by local conditions that prevent the developing interface from developing overhangs.As a scholastic example of the local class of models Kim and Kosterlitz [9] introduced a simple discrete model of a growing interface. In this model the growth process is simulated by randomly choosing a site and allowing the interface to grow one unit if all slopes remain small (e.g., < 1). If this condition is not fulfilled a new site is chosen randomly. In the long-wavelength limit this process can be described by the Kardar-Parisi-Zhang (KPZ) equation [10] dh ^^ xfdhy , .(where. The results of this algorithm are the well-known scalings [11] for the ensemble averaged width w of the interface, w'^ = ((/i -(ft))2> oc t^^fit^l^lL) with X = 1/2 as the roughness exponent of the saturated interface and with /5 = xl^ = 1/3 describing the transient roughening. Experimentally determined x for one-dimensional interfaces ranges from x = 0.55 ±0.06 in electrochemical deposition [2], X = 0.78 ± 0.07 in growth of bacterial colonies [4], to a X of 0.63±0.04 ([7]), 0.73±0.03 ([5]), and « 0.81 ([6]) measured for fluid invasion of porous media. In all experiments the measured x are above the one predicted by the KPZ universality class. And although x = 0.55±0.06 in electrochemical deposition is within the range of the KPZ prediction, the measured dynamics of the surface growth in Ref.[2] are much faster than that predicted by KPZ.It is known that the type of noise plays a big role in the growth of an interface. If the noise is changed either to a spatially or a temporally power-law-correlated noi...