2006
Role of Nanoscale Strain Inhomogeneity on the Light Emission from InGaN Epilayers
Abstract: InGaN is the basis of a new generation of light‐emitting devices, with enormous technological potential; it is currently one of the most intensively studied semiconductor materials. It is generally accepted that compositional fluctuations resulting from phase segregation are the origin of the high luminescence efficiency of InGaN. Evidence to show that nanoscale strain inhomogeneity plays a fundamental role in determining the spectral properties of InGaN–GaN heterostructures is reported. For layers above a cer…
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Cited by 62 publications
(45 citation statements)
References 32 publications
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“…4 suggest different relaxations state, the multi-peak pattern cannot be explained with phase separation. Therefore, we speculate the multi-peak phenomenon is a result of the strain relaxation process, which is also observed by other groups 19 – 22 . As the growth proceeds, the InGaN-1 layer with x In ~ 0.09 is initially coherently grown on the smooth GaN template, similar to the case of the layer in Fig.…”
Section: Resultssupporting
confidence: 81%
“…4 suggest different relaxations state, the multi-peak pattern cannot be explained with phase separation. Therefore, we speculate the multi-peak phenomenon is a result of the strain relaxation process, which is also observed by other groups 19 – 22 . As the growth proceeds, the InGaN-1 layer with x In ~ 0.09 is initially coherently grown on the smooth GaN template, similar to the case of the layer in Fig.…”
Section: Resultssupporting
confidence: 81%
“…A similar conclusion was drawn in Ref. 43. The study presented therein is based on XRD and AFM measurements on a macroscopic level, highlighting again that the findings from the microscopic analysis presented here accurately reflects macroscopic properties of InGaN epilayers.…”
Section: B Strain In Quasi-bulk Ingansupporting
confidence: 88%
“…The second diffraction spot corresponds to a fully relaxed 20% InGaN layer. Similar results have been observed for thick InGaN layers in [22][23][24][25][26][27][28][29].…”
Section: Application To Ingan Layers Presenting Double Xrd Diffractio...supporting
confidence: 87%
