Review of CVD TiN coatings for wear-resistant applications: deposition processes, properties and performance

Rebenne, H.E.; Bhat, Deepak

doi:10.1016/s0257-8972(05)80002-7

Cited by 173 publications

(68 citation statements)

References 43 publications

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“…Like most of refractory transition metal nitrides with NaCl-type structure, TiN is a superconductor with transition temperature about 5 K. TiN x keeps NaCl-type structure at a variant of N content (0.6<x<1.2), with different lattice constants and physical properties. [1] TiN has been mainly applied in hard coatings, [2] due to it exceptional combination of physical properties and chemical and metallurgical stability. [3] Some calculations have given detailed information about the electronic energy-band structure, indicating it is a conductor at ambient condition.…”

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confidence: 99%

Isostructural Phase Transition of TiN under High Pressure

Zhao

Yang

et al. 2005

Chinese Phys. Lett.

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In situ high-pressure Recently, titanium nitride has aroused intensive interests because of its simple structure and special properties such as high melting point, high hardness, high corrosion resistance, high specific strength, and metallic conductivity. Like most of refractory transition metal nitrides with NaCl-type structure, TiN is a superconductor with transition temperature about 5 K. TiN x keeps NaCl-type structure at a variant of N content (0.6

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confidence: 99%

Isostructural Phase Transition of TiN under High Pressure

Zhao

Yang

et al. 2005

Chinese Phys. Lett.

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“…The temperature of the reaction gases entering the reactor is 300 K. The mass fraction of silane is kept at 0.1 because it ensures sufficient amounts of precursor gas in the mixture (Rebenne and Bhat, 1994). The inlet flow velocity, V , and susceptor temperature, T , contributes a lot in the flow and the deposition profile so they are considered as the design variables in this case study.…”

Section: Figmentioning

confidence: 99%

“…Other modern CVD processes reach high or ultra-high vacuum (below 6 10 − Pa) and have high-quality thin-film depositions. Table 1 Common materials in different applications of the CVD processes (Sherman, 1987;Gardeniers et al, 1989;Breiland and Coltrin, 1990;Fotiadis et al, 1990;Creighton and Parmeter, 1993;Gladfelter, 1993;Rebenne and Bhat, 1994;Cheng et al, 1995;Hintermann, 1996;Mahajan, 1996 A CVD instrument with plasma enhancement where higher density of reactant species are produced to the substrate due to the high-energy electron impact. Higher activity of the gaseous species allows deposition at comparatively low temperature (450 to 650 K).…”

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confidence: 99%

Systematic Strategy for Modeling and Optimization of Thermal Systems With Design Uncertainties

Jaluria¹,

Gea²,

Lin³

2010

Frontiers in Heat and Mass Transfer

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Thermal systems play significant roles in the engineering practice and our lives. To improve those thermal systems, it is necessary to model and optimize the design and the operating conditions. More importantly, the design uncertainties should be considered because the failures of the thermal systems may be very dangerous and produce large loss. This review paper focuses on a systematic strategy of modeling and optimizing of the thermal systems with the considerations of the design uncertainties. To demonstrate the proposed strategy, one of the complicated thermal systems, Chemical Vapor Deposition (CVD), is simulated, parametrically modeled, and optimized. The operating conditions, inlet velocities and susceptor temperatures, are the most significant factors in the CVD and are chosen as the design variables. Several responses -including the percentage of the working area, the mean of the deposition rate, the root mean square of the deposition, and the surface kurtosis -are chosen based on the physical needs and statistical foundations, and are utilized to represent the productivity and the quality of the thin-film deposition. One of the Response Surface Method (RSM), the Radial Basis Function (RBF), is employed to formulate the objective and constraint functions for the optimization. However, it is not until the design uncertainties are considered that the thermal system designs have high risk of the violations of the performance constraints. The Reliability-Based Design Optimization (RBDO) algorithms are used to solve the optimization problems with the design uncertainties. The most famous RBDO methods are the Reliability Index Approach (RIA) and the Performance Measure Approach (PMA). In RBDO, probabilistic constraints are established with respect to either normally or non-normally distributed random variables. The optimal solutions are found subjected to the allowable level of the failure probabilities. The Monte Carlo Simulation (MCS) results can be used to evaluate the failure probabilities. As a result, the proposed systematic strategy of parametrically modeling and optimizing with design uncertainties can be applied to either experiments or simulations of other thermal systems to quantitatively represent the performances, improve their productivity, maintain the quality control, and reduce the probability of the system failure.

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“…TiN coating is also used in integrated circuits, solar cells, transparent films, and photothermal conversion 19 . Various deposition methods have been employed to deposit TiN coatings, such as dip-coating, sol-gel, thermal oxidation, e-beam, sputtering, chemical vapor deposition (CVD), plasma-enhanced CVD, metalorganic CVD, and molecular beam epitaxy 14,[20][21][22][23][24][25][26][27][28][29][30] .…”

Section: Introductionmentioning

confidence: 99%