Removal of nanoparticles on silicon wafer using a self-channeled plasma filament

Park, Jungkyu; Yoon, Ji-Wook; Whang, Kwang Youn; Cho, Sung-Hak

doi:10.1007/s00339-012-7024-1

Cited by 8 publications

(6 citation statements)

References 11 publications

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“…That is, high-pressure gas passes through the nozzle to generate airflow to sweep particles on the surface. − Xu et al removed 60–80% of SiO 2 particles from the surface with a jet spray nozzle, accelerated by a N 2 gas flow. In addition to the above traditional methods, several new methods have been proposed to remove particles from the surface, such as gas bullets, plasma, and electrostatics …”

Section: Introductionmentioning

confidence: 99%

“…19−21 Xu et al 22 removed 60−80% of SiO 2 particles from the surface with a jet spray nozzle, accelerated by a N 2 gas flow. In addition to the above traditional methods, several new methods have been proposed to remove particles from the surface, such as gas bullets, 23 plasma, 24 and electrostatics. 25 Although the methods were developed to remove nanoparticles from the surface, no approach was reported to differentially remove nanoparticles from a surface based on the property of particles.…”

Section: Introductionmentioning

confidence: 99%

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Differential Removal of Nanoparticles on the Surface of a Thin Film Substrate

Huang

Guo

2021

ACS Omega

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Purposeful identification, selection, and collection of particles are of great significance in environmental research. Microscopy is the common technique used in previous studies of particle identification. However, the microscopic technique was intricate and time-consuming. To conduct an intensive analysis of targeted particles, there is a need for the development of a simple method that can differentially abandon the nontargeted particles and only retain the targeted particles on the surface of a substrate. In the study, three methods were attempted for differential removal of nontargeted nanoparticles on the surface, including air jet, nanobubble, and ultrasonic methods. Acidic particles were taken as the targeted particles, while nonacidic particles were regarded as nontargeted particles. The results showed that regardless of methods, acidic particles were retained on the surface due to the strong particle–surface interaction. As for nonacidic particles, air jet treatment and nanobubble treatment were not able to completely remove nonacidic particles from the surface with the removal efficiencies of 5.1 ± 3.4 and 89.3 ± 4.1%, respectively, while the nonacidic particles were entirely removed in the ultrasonic treatment. Ethanol rather than deionized (DI) water was the proper solution in the ultrasonic treatment to avoid contamination. In conclusion, ultrasonic by ethanol was fully efficient for differential removal of nonacidic particles on the surface. The principle of differential removal of particles is the differences in the particle–surface interaction force between nonacidic particles (i.e., physically attached particles) and acidic particles (i.e., chemically formed particles). Nonacidic particles are removed from the surface through cavitation to form bubbles in the gap between a nonacidic particle and the surface in the ultrasonic treatment. In contrast, the space between an acidic particle and the surface is filled by the reaction, and thus bubbles cannot enter the crevice to remove the acidic particle. The developed method is useful for aerosol research.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Differential Removal of Nanoparticles on the Surface of a Thin Film Substrate

Huang

Guo

2021

ACS Omega

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“…Given the rapid developments in the microelectronics industry, the requirements related to the cleanliness of the ultrasmall parts used in the industry are becoming more stringent. The presence of micro/nanoparticles of various contaminants can adversely affect the quality of precision devices, semiconductors, and high-threshold optical components [1][2][3][4]. Conventional laser-cleaning methods such as dry laser cleaning [5], stream/wet laser cleaning [6,7], and matrix laser cleaning have several disadvantages [8].…”

Section: Introductionmentioning

confidence: 99%

“…Conventional laser-cleaning methods such as dry laser cleaning [5], stream/wet laser cleaning [6,7], and matrix laser cleaning have several disadvantages [8]. For example, they have low removal efficiencies in the case of nanoparticles and can damage the substrate [1]. Thus, there are ongoing efforts to develop improved cleaning technologies.…”

Section: Introductionmentioning

confidence: 99%

Investigation on ultimate results and formation mechanism of the micro-nano particles removal by laser plasma

Jun¹,

Lai²,

Li³

et al. 2020

Laser Phys. Lett.

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Micro/nanoparticles contamination is one of the key factors affecting the quality of precision manufacturing, and the traditional cleaning methods cannot function effectively. The laser plasma has high temperature and pressure, which can be used as a new and potential method to implement the removal of micro/nanoparticle, and it has become the focus of attention. This paper aims to analyze the particles removal process under the action of repetitively pulsed laser plasma, which is mainly composed of the changes in particle morphologies, the ultimate removal results, as well as the corresponding academic analysis based on the thermodynamic effects. Investigation results show that the particles removal characteristics depend heavily on the number of pulsed plasma, micrometer-size particles can be removed at the beginning, and then particles with the size about several hundred nanometers in the following stages. Analyzed from the morphological properties of particles, the refinement can be found, more specifically, the particle can be broken up into more smaller ones under the action of laser plasma with high pressure and temperature. The particles refinement will deepen the difficulty on removal efficiency, and when the particles ultimately convert into ultrasmall nanoparticles with several nanometers, which will attach to substrate presenting as flocculent aggregate, and cannot be completely wiped out.

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“…An alternative dry cleaning method by using laser shock waves has been demonstrated to remove the submicron particles from solid surfaces [13][14][15][16]. In this method, the laser beam direction is parallel to the substrate, and a gap exists between the laser beam and substrate.…”

Section: Introductionmentioning

confidence: 99%

Nanotribological Properties of Nanotextured Ni-Co Coating Surface Measured with AFM Colloidal Probe Technique

2017

JLMN

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This paper proposes an alternative laser cleaning technique for silicon wafers to overcome the difficulties in removing submicron particles by using the conventional ultrasonic cleaning method. An Nd:YAG laser was applied on the back side of a wafer submerged in water. The laser energy induced shock waves in the wafer, which were transmitted into the water and a streaming bubble flow was generated. The shock waves and bubble flow removed the alumina particles of 0.5 µm in size from the wafer surface. Because the wafer was in contact with the water, the damage caused by the laser heat was significantly reduced. This study analyzed the laser stationary and laser scan cleaning techniques and established the laser power and scanning speed parameters. The cleaning efficiency of the proposed technique was found to be excellent, and the laser power required was less than 50 W. The temperature increase in the wafer caused by the laser heating was less than 30°C. Thus, the proposed acoustic streaming technique has great potential to provide an improved solution for silicon wafer cleaning.

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Removal of nanoparticles on silicon wafer using a self-channeled plasma filament

Cited by 8 publications

References 11 publications

Differential Removal of Nanoparticles on the Surface of a Thin Film Substrate

Differential Removal of Nanoparticles on the Surface of a Thin Film Substrate

Investigation on ultimate results and formation mechanism of the micro-nano particles removal by laser plasma

Nanotribological Properties of Nanotextured Ni-Co Coating Surface Measured with AFM Colloidal Probe Technique

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