2021
DOI: 10.1021/acsnano.1c08208
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Reconfigurable Multivalue Logic Functions of a Silicon Ellipsoidal Quantum-Dot Transistor Operating at Room Temperature

Abstract: Reconfigurable multivalue logic functions, which can perform the versatile arithmetic computation of weighted electronic data information, are demonstrated at room temperature on an all-around-gate silicon ellipsoidal quantum-dot transistor. The large single-hole transport energy of the silicon quantum ellipsoid allows the stable M-shaped Coulomb blockade oscillation characteristics at room temperature, and the all-around-gate structure of the fabricated transistor enables us to perform the precise self-contro… Show more

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Cited by 10 publications
(17 citation statements)
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“…where G N+1 b is the multiplication of the tunnel barrier conductance, k B is the Boltzmann constant, and T eff is the effective electron temperature. For example, the I valley values for the single (N = 1), double (N = 2), and triple (N = 3) QD systems can be derived by Equations ( 3)-( 5), respectively [9,10]:…”
Section: Resultsmentioning
confidence: 99%
See 2 more Smart Citations
“…where G N+1 b is the multiplication of the tunnel barrier conductance, k B is the Boltzmann constant, and T eff is the effective electron temperature. For example, the I valley values for the single (N = 1), double (N = 2), and triple (N = 3) QD systems can be derived by Equations ( 3)-( 5), respectively [9,10]:…”
Section: Resultsmentioning
confidence: 99%
“…Thereafter, the surface of the suspended Si nanowire was oxidized by dry oxidation at 900 • C to form the gate oxide layer. During this step, the final diameter size of the Si nanowire was further shrunken down to <5 nm [7][8][9][10][11]. Through the sequential deposition of additional SiO 2 (≈30 nm) and n + poly-Si (≈250 nm) gate (G), finally, the formation of the GAA stacks was finalized.…”
Section: Methodsmentioning
confidence: 99%
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“…It was enabled by utilizing Si ellipsoidal QD systems (EQD) with large spacings between quantum levels. [ 105 ] The Si EQD SET was self‐formed by using subsequent isotropic wet etching and thermal oxidation of the Si nanowire. The tunnel barriers were implemented as very thin areas (much less than 5 nm) adjacent to the central Si ellipsoid (Figure 8h).…”
Section: Mvl Devices Based On Design Of Transfer Id–vg Characteristicsmentioning
confidence: 99%
“…[15][16][17][18] In particular, room-temperature operation of electron tunneling via a single donor has been realized via specially designed channels. [19][20][21][22] Due to the surface-transport mode, these miniaturized inversion-mode (IM) transistors show electrical characteristics strongly dependent on dopant atoms close to the gate dielectric. 23 The random distribution of dopants within the nanoscale channels would introduce significant fluctuations in the quantum properties of IM transistors, [24][25][26] which is detrimental to constructing quantum electronic systems.…”
Section: Introductionmentioning
confidence: 99%