2012
DOI: 10.1021/nl303801u
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Real-Time Visualization of Convective Transportation of Solid Materials at Nanoscale

Abstract: Convective transportation of materials in the solid state occurring in a prototype solid bilayer system of Al and Si with negligible mutual solubility has been directly imaged in real time at nanoscale using a valence energy-filtered transmission electron microscope. Such solid-state convection is driven by the stress gradient developing in the bilayer system due to the amorphous to crystalline phase transformation of the Si sublayer. The process is characterized by compression experienced in the Si phase crys… Show more

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Cited by 64 publications
(75 citation statements)
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“…In the field of group-IV semiconductors including Si, [27][28][29][30][31] Ge, [32][33][34][35] and SiGe, 36,37 metal-induced layer exchange (MILE) allows large-grained (>30 lm) highly oriented thin films to be formed on insulators. In MILE, an amorphous semiconductor layer crystallizes by "layer exchange" between the amorphous layer and a catalyst metal layer.…”
mentioning
confidence: 99%
“…In the field of group-IV semiconductors including Si, [27][28][29][30][31] Ge, [32][33][34][35] and SiGe, 36,37 metal-induced layer exchange (MILE) allows large-grained (>30 lm) highly oriented thin films to be formed on insulators. In MILE, an amorphous semiconductor layer crystallizes by "layer exchange" between the amorphous layer and a catalyst metal layer.…”
mentioning
confidence: 99%
“…As a result of both effects, Al tends to migrate toward the free-volumerich, tensilely stressed Si layer (in situ XRD stress measurements have indicated [12,15], indeed, the relaxation of the compressive stress in the Al phase during MIC). Thus, the Al layer is gradually "replaced" by the c-Si grains growing inside it, and the Al migrates to the original location of the a-Si layer, as revealed by the development of convective Al "plumes" comprising many Al nanocrystals (see Fig.…”
Section: Continued Crystallization and Layer Exchangementioning
confidence: 99%
“…Amorphous semiconductors such as silicon and germanium can crystallize at a temperature much lower than their "bulk" crystallization temperatures when they are put in direct contact with a metal, such as Al [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17], Au [18][19][20][21][22], Ag [23][24][25], Ni [26][27][28][29][30][31][32][33], Cu [34][35][36], and Pd [37,38]. This phenomenon, which was firstly observed more than 40 years ago for amorphous germanium [39], is now commonly referred to as metal-induced crystallization (MIC) [40][41][42][43].…”
Section: Introductionmentioning
confidence: 99%
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“…Therefore, MIC method is the most promising method to obtain high quality poly‐Ge films at temperatures much lower than those required in the absence of a metal catalyst. In MIC, Al, Au, and Ag have been used as the catalyst metals for crystallizing α ‐Ge films. These metals can lower the crystallization temperature of α ‐Ge films by forming eutectic alloy during thermal annealing .…”
Section: Introductionmentioning
confidence: 99%