Reaction of methanol with porous silicon

Methanol adsorption on silicon (001)

“…As is the case for the adsorption of the first molecule, our calculations indicate that the adsorption of a second methanol molecule is barrierless. This is in agreement with the overall experimental picture [7,8,11,12] pointing out to a saturation coverage 2 As the adsorption energy for the mol O structure is around 15 kcal/mol (corresponding to a thermal activation energy of 220 K) and the activation energy for the complete dissociation process is close to 58 kcal/mol (corresponding to a thermal activation energy around 850 K), the desorption is more likely to be observed than the dissociation process, but the latter event is not forbidden. of around 0.5 ML, i.e., one methanol molecule per dimer.…”

“…It has been recently suggested by Eng et al [1] that ethanol can be used as precursor for low pressure chemical vapour deposition of SiO 2 . These authors suggest that the adsorption of ethanol onto the silicon surface resulted in the cleavage of the O-H bond and formation of Si-OC 2 methanol with both porous silicon [2] and the Si(1 1 1) surface [3] is found to exhibit a similar behaviour, i.e., the cleavage of the O-H bond and formation of Si-OCH 3 , methanol could well be another good candidate for the SiO 2 deposition. Besides that, the methoxy group (-OCH 2 ) formed as a result of the interaction of the methanol interaction with the silicon surface has been used to probe the silicon surface.…”

Characterization of silicon nanoporous pillar array as room-temperature capacitive ethanol gas sensor

“…The big shift of the baseline of PS-based capacitive sensors has long been one of the most serious shortcomings, and the underlying reasons are due to the unstable Si-H bonds formed on the PS surface during the traditional anodization process [25,26]. In the Si-NPA ethanol sensor, this instability was greatly improved.…”

Atomic Layer Deposition of Aluminum Oxide on Carboxylic Acid-Terminated Self-Assembled Monolayers

“…26 The peak at ∼1200 cm -1 could be assigned to the CH 3 symmetric deformation mode of Al-CH 3 . 18,[31][32][33] The additional features at ∼706 cm -1 and 2800-3000 cm -1 are assigned to the corresponding CH 3 rocking modes and stretch modes. 34,35 Additional sequential exposures to TMA bring only slight changes in the region around 1580 cm -1 , which could result from shifts due to interference of CdO bond in CO-O-Al by the adsorption of nonreacted TMA molecule in the surrounding environment.…”