2022
DOI: 10.2139/ssrn.4116057
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Rational Design of Si(B)Cn Microstructures Using Direct Photolithography of Patternable Preceramic Photoresists

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Cited by 1 publication
(3 citation statements)
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“…Depending on the type of photoresist, exposing it to light either removes or leaves the sensitive layer behind (positive or negative, respectively). As a result, the pattern is transferred from the overlaying mask to the photoresist [63]. Following that, other techniques such as etching are used.…”
Section: Photolithographymentioning
confidence: 99%
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“…Depending on the type of photoresist, exposing it to light either removes or leaves the sensitive layer behind (positive or negative, respectively). As a result, the pattern is transferred from the overlaying mask to the photoresist [63]. Following that, other techniques such as etching are used.…”
Section: Photolithographymentioning
confidence: 99%
“…Photolithography's rapid and selective UV-curing allows for faster fabrication than soft lithography. In light of this, there has been an increase in the preparation of preceramic photoresists [63].…”
Section: Photolithographymentioning
confidence: 99%
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