2016
DOI: 10.1021/acsnano.6b06290
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Rapid Focused Ion Beam Milling Based Fabrication of Plasmonic Nanoparticles and Assemblies via “Sketch and Peel” Strategy

Abstract: Focused ion beam (FIB) milling is a versatile maskless and resistless patterning technique and has been widely used for the fabrication of inverse plasmonic structures such as nanoholes and nanoslits for various applications. However, due to its subtractive milling nature, it is an impractical method to fabricate isolated plasmonic nanoparticles and assemblies which are more commonly adopted in applications. In this work, we propose and demonstrate an approach to reliably and rapidly define plasmonic nanoparti… Show more

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Cited by 123 publications
(93 citation statements)
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“…Selective polymer growth can also be accomplished on lithographically-fabricated nanostructures (Fig. S6 in the ESM) [21,22], which provides a useful technique towards functional nanophotonic and nanoelectronic devices.…”
Section: Local Selective Polymer Growth With Plasmonsmentioning
confidence: 99%
“…Selective polymer growth can also be accomplished on lithographically-fabricated nanostructures (Fig. S6 in the ESM) [21,22], which provides a useful technique towards functional nanophotonic and nanoelectronic devices.…”
Section: Local Selective Polymer Growth With Plasmonsmentioning
confidence: 99%
“…Chapter S2 of the Supporting Information). The dimer antennas remained on the substrate because of the formation of a sidewall coating [52]. Here, charging effects of the sample during the image acquisition precluded high-resolution SEM images of isolated, stripped dimer antennas.…”
Section: Sample Preparationmentioning
confidence: 99%
“…At higher ion doses, the ion bombardment can lead to an undesired implantation of helium at the substrate-metal interface [51]. To overcome this issue, Chen et al [52] introduced a simple, fast, and reliable fabrication technique called "sketch and peel"-based FIB milling (SaP). In this process, a FIB at an appropriate dose is used to sketch only the outline of the desired plasmonic nanostructure to completely separate the particle and the rest of the film.…”
Section: Introductionmentioning
confidence: 99%
“…[1][2][3][4] The hotspots from giant nanofocusing effect strongly enhance the interaction between electromagnetic waves and metallic nanoparticles Adv. [15,16] In this process, only the outline template of the target structures is defined, and then, the target structures can be obtained via selective stripping of the deposited metallic film. 2020, 8,1901202 www.advopticalmat.de Motivated by this demand on plasmonic nanogap fabrication, we previously developed a "Sketch and Peel" lithography (SPL) process for high-resolution multiscale patterning of plasmonic nanogaps.…”
Section: Introductionmentioning
confidence: 99%