Properties of transparent conductive ZnO:Al thin films prepared by magnetron sputtering

Fu, E.G.; Zhuang, Da Ming; Gong, Zhengliang; Zhao, Ming; Yang, Wei; Liu, Jia Jun

doi:10.1016/s0026-2692(03)00251-9

Cited by 73 publications

(32 citation statements)

References 7 publications

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“…Particularly, the increase of pulse frequency allows the sputtered atoms to move into more stable surface sites during deposition, which leads to the increase of crystallite size and the decrease of grain (e) RMS surface roughness measured by AFM with pulse frequencies boundary scattering due to charge carrier. It also allows the surface roughness of films to decrease [28]. This is the reason why the crystallinity of IZO films increases with the increase of pulse frequency till 30 kHz.…”

Section: Resultsmentioning

confidence: 99%

“…As the surface roughness decreases, the effective surface area of films as well as the number of absorption sites for oxygen also decrease. These lead to the decrease of the resistivity and the improving the Hall mobility due to diminishing in grain boundary scattering [28]. Figure 4 shows the carrier concentration, Hall mobility, and electrical resistivity with variation of pulse frequency.…”

Section: Resultsmentioning

confidence: 99%

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Physical properties of transparent conducting indium doped zinc oxide thin films deposited by pulsed DC magnetron sputtering

et al. 2008

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Transparent conducting In-doped (1at.%) zinc oxide (IZO) thin films are deposited on glass substrate by bipolar pulsed DC magnetron sputtering. We have investigated the effect of pulse frequency on the physical properties of the IZO films. A highly c-axis oriented IZO thin films were grown in perpendicular to the substrate. At optimal deposition conditions, IZO films with a smoothest surface roughness of ∼3.6 nm, a low-resistivity of 5.8× 10 −3 Ωcm, and a high mobility of 14 cm/Vs were achieved. The optical spectra showed a high transmittance of above 85% in the UV-visible region and exhibited the absorption edge of near 350 nm. In micro-Raman, we observed the three phonon modes of host ZnO, which are E 2 low , E 2 high , and A 1 modes, and the three additional modes. The origin of three additional modes is attributed to the host lattice defect due to the effect of In dopant and increasing the pulse frequency.

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Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Physical properties of transparent conducting indium doped zinc oxide thin films deposited by pulsed DC magnetron sputtering

et al. 2008

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“…Progress made in the area of ZnObased materials and devices shows that ZnO has a great potential due to its wide and direct band gap of 3.37 eV and a large excitonic binding energy of 60 meV at room temperature [12]. In the past several years, various methods have been employed to prepare ZnO films such as chemical vapor deposition (CVD) [13][14][15], rf magnetron sputtering [16,17], sol-gel process [18,19], photoatomic layer deposition [20], spray pyrolysis [21,22], metal oxide chemical vapour deposition (MOCVD) [23], molecular beam epitaxy (MBE) [24,25], filtered cathodic vacuum arc technique (FCVA) [26,27] and pulsed laser deposition (PLD) [28][29][30][31].…”

Section: Introductionmentioning

confidence: 99%

Structural and optical properties of nano-structured tungsten-doped ZnO thin films grown by pulsed laser deposition

Ngom

Mpahane

Manyala

et al. 2009

Applied Surface Science

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“…5 Al-doped ZnO (AZO) thin films deposited on rigid glass substrates have been extensively studied in recent years because they combine attractive properties with high visible transparency and electrical conductivity. 6 As is well known, glass is very heavy and brittle and can be easily deformed, especially for certain applications such as smart cards and electronic maps, where flexibility and light weight materials are required. 7 Transparent conducting films deposited on flexible polymer substrates, therefore, could overcome these problems, and it is important to investigate the characteristics of oxide thin films deposited on polymer substrates such as nonwovens.…”

Section: Introductionmentioning

confidence: 99%

Physical properties of Al-doped ZnO films deposited on nonwoven substrates by radio frequence magnetron sputtering

2008

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In this study, the polyethylene terephthalate (PET) spunbonded nonwoven materials were used as substrates for creating electro-optical functional nanostructures on the fiber surfaces. A magnetron sputter coating was used to deposit Al-doped ZnO (AZO) films onto the nonwovens. The influences of the deposition time on the structural, optical, and electrical properties of AZO films were investigated. Atomic force microscopy (AFM) was employed to examine the topography of the fibers. The AFM observation revealed a significant difference in the morphology of the fibers before and after the AZO sputter coating. The examination by UV-visible spectrophotometer analysis showed that the nonwovens deposited with transparent nanostructure AZO films had better UV absorption, and an average transmittance was approximately 50% in the visible light wavelength region. The surface conductivity of the materials was analyzed using a four-probe meter, and it was found that electrical resistance was significantly decreased as the sputtering time increased.

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Properties of transparent conductive ZnO:Al thin films prepared by magnetron sputtering

Cited by 73 publications

References 7 publications

Physical properties of transparent conducting indium doped zinc oxide thin films deposited by pulsed DC magnetron sputtering

Physical properties of transparent conducting indium doped zinc oxide thin films deposited by pulsed DC magnetron sputtering

Structural and optical properties of nano-structured tungsten-doped ZnO thin films grown by pulsed laser deposition

Physical properties of Al-doped ZnO films deposited on nonwoven substrates by radio frequence magnetron sputtering

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