2013
DOI: 10.1186/1556-276x-8-157
|View full text |Cite
|
Sign up to set email alerts
|

Properties of GaN-based light-emitting diodes on patterned sapphire substrate coated with silver nanoparticles prepared by mask-free chemical etching

Abstract: This study reports on the use of a template that is made of silver nanoparticles (ANPs) that are dispersed on a patterned sapphire substrate (PSS) to improve the light output power of GaN-based light-emitting diodes (LEDs). The dipping of a sapphire substrate in hot H2SO4 solution generates white reaction products that are identified as a mixture of polycrystalline aluminum sulfates. These white reaction products can act as a natural etching mask in the preparation of an ANP-coated PSS (PSS-ANP) template. The … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4

Citation Types

0
4
0

Year Published

2014
2014
2024
2024

Publication Types

Select...
8
1

Relationship

0
9

Authors

Journals

citations
Cited by 11 publications
(4 citation statements)
references
References 12 publications
0
4
0
Order By: Relevance
“…During the last decade, group III-V nitrides are very promising semiconductor materials for application in high frequency heterojunction field-effect transistors (HFETs) [ 1 - 8 ]. Large band offsets at the heterojunctions are important to realize these device applications.…”
Section: Introductionmentioning
confidence: 99%
“…During the last decade, group III-V nitrides are very promising semiconductor materials for application in high frequency heterojunction field-effect transistors (HFETs) [ 1 - 8 ]. Large band offsets at the heterojunctions are important to realize these device applications.…”
Section: Introductionmentioning
confidence: 99%
“…To improve the quality of InGaN epitaxy grown on sapphire substrate and to solve lattice structure mismatch between the sapphire substrate and GaN, researchers have developed epitaxy techniques, such as epitaxial lateral overgrow [6], micro-level SiNx with patterned SiNx interlayer structures, and patterned sapphire substrates [7,8]. Research efforts related to growing GaN on non-polarized sapphire substrates have gained considerable attention in recent years, especially because of the results reported by S. Nakamura and his team [9][10][11].…”
Section: Introductionmentioning
confidence: 99%
“…Both the crystalline quality and the light extraction efficiency (LEE) of LEDs can be improved significantly. 2,3 A trend with PSS technology is to shrink the pattern size to get more light extraction [4][5][6][7] and to resolve the wafer bowing problems in GaN growth on large size sapphire substrates (more than 4 inch) 8,9 and in thick film growth, such as 300 μm or more on a heterogeneous substrate. 10 Nano PSS (NPSS) have been paid much attention for the fabrication of high efficiency LEDs in recent years.…”
Section: Introductionmentioning
confidence: 99%