2021
DOI: 10.1016/j.jpcs.2020.109907
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Prominent c-axis oriented Si-doped ZnO thin film prepared at low substrate temperature in RF magnetron sputtering and its UV sensing in p-Si/n-SZO heterojunction structures

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Cited by 9 publications
(5 citation statements)
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“…Figure depicts the lattice strain and dislocation densities as calculated using the following equations, , = β nobreak0em0.1em⁡ cos nobreak0em0.25em⁡ θ 4 , and 0.25em δ = 1 D 2 …”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Figure depicts the lattice strain and dislocation densities as calculated using the following equations, , = β nobreak0em0.1em⁡ cos nobreak0em0.25em⁡ θ 4 , and 0.25em δ = 1 D 2 …”
Section: Resultsmentioning
confidence: 99%
“…Figure depicts the lattice strain and dislocation densities as calculated using the following equations, , …”
Section: Resultsmentioning
confidence: 99%
“…36-1451), respectively. 7,22,33 The diffraction peaks identified by (#) at 38.42°and 66.65°are indexed as the (200) and (311) planes of the Ag 2 O cubic phases (JCPDS Card No. 41-1104), respectively.…”
Section: Resultsmentioning
confidence: 99%
“…The diffraction peaks [labeled as (*)] emerged at 2θ = 32.06, 34.78, 36.57, 47.86, 56.91, 63.17, 66.58, 68.23, and 69.33° are ascribed to the (100), (002), (101), (102), (110), (103), (200), (112), and (201) planes of wurtzite ZnO (JCPDS Card No. 36-1451), respectively. ,, The diffraction peaks identified by (#) at 38.42° and 66.65° are indexed as the (200) and (311) planes of the Ag 2 O cubic phases (JCPDS Card No. 41-1104), respectively. , The Ag 2 O characteristic peak intensities were relatively feeble due to the presence of Ag 2 O in minute concentration.…”
Section: Resultsmentioning
confidence: 99%
“…These typical 3A group elements serve as shallow donors, supplying one electron each [5]. From the point of a view of the introduction of a new element, silicon has also been shown to be an effective donor in the films fabricated using RF sputtering [6] and may be suitable as an effective dopant to improve various devices [7]. Since Si has atomic size of 1.17 Å, which is similar to or slightly less than Zn, using Si as ZnO film dopant could reduce lattice mismatch [8].…”
Section: Introductionmentioning
confidence: 99%