2012
DOI: 10.1117/12.925811
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Abstract: Our development of ultra light-weight X-ray micro pore optics based on MEMS (Micro Electro Mechanical System) technologies is described. Using dry etching or X-ray lithography and electroplating, curvilinear sidewalls through a flat wafer are fabricated. Sidewalls vertical to the wafer surface are smoothed by use of high temperature annealing and/or magnetic field assisted finishing to work as X-ray mirrors. The wafer is then deformed to a spherical shape. When two spherical wafers with different radii of curv… Show more

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Cited by 3 publications
(1 citation statement)
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“…The X-ray-etched microstructure has vertical sidewalls with surface roughness in the range of 10–20 nm and depth greater than 1 mm with feature resolution accuracies of few microns, which are attractive for optical device fabrication. XRL is used for fabrication of X-ray optics, 146 desktop monochromator, 147 X-ray refractive lenses and X-ray kinoform lenses. 148 Ultra lightweight X-ray micro-pore optics based on MEMS technologies using XRL and electroplating in curvilinear sidewalls through a flat wafer are fabricated and they have been stacked to form the Wolter type I telescope.…”
Section: Deep X-ray Lithographymentioning
confidence: 99%
“…The X-ray-etched microstructure has vertical sidewalls with surface roughness in the range of 10–20 nm and depth greater than 1 mm with feature resolution accuracies of few microns, which are attractive for optical device fabrication. XRL is used for fabrication of X-ray optics, 146 desktop monochromator, 147 X-ray refractive lenses and X-ray kinoform lenses. 148 Ultra lightweight X-ray micro-pore optics based on MEMS technologies using XRL and electroplating in curvilinear sidewalls through a flat wafer are fabricated and they have been stacked to form the Wolter type I telescope.…”
Section: Deep X-ray Lithographymentioning
confidence: 99%