Precise Control of Nanopore Size in Thin Film Using Mixtures of Asymmetric Block Copolymer and Homopolymer

Jeong, Unyong; Ryu, Du Yeol; Kim, Jin Kon; Kim, Dong Ha; Wu, Xiadong; Russell, Thomas P.

doi:10.1021/ma034976i

Cited by 85 publications

(65 citation statements)

References 21 publications

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“…17g) could be useful in patterning dots on a square lattice not currently accessible via diblock copolymer lithography. The incorporation of a small amount of homopolymer has also been shown to have interesting effects on the nanopatterning of block copolymers [239][240][241]. As of yet, it is unclear how standard alignment techniques will work on these more complex systems.…”

Section: Discussionmentioning

confidence: 99%

Patterning with block copolymer thin films

Segalman

2005

Materials Science and Engineering: R: Reports

931

921

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The nanometer-scale architectures in thin films of self-assembling block copolymers have inspired a variety of new applications. For example, the uniformly sized and shaped nanodomains formed in the films have been used for nanolithography, nanoparticle synthesis, and high-density information storage media. Imperative to all of these applications, however, is a high degree of control over orientation of the nanodomains relative to the surface of the film as well as control over order in the plane of the film. Induced fields including electric, shear, and surface fields have been demonstrated to influence orientation. Both heteroepitaxy and graphoepitaxy can induce positional order on the nanodomains in the plane of the film. This article will briefly review a variety of mechanisms for gaining control over block copolymer order as well as many of the applications of these materials. Particular attention is paid to the potential of perfecting long-range two-dimensional order over a broader range of length scales and the extension of these concepts to functional materials and more complex architectures. #

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Section: Discussionmentioning

confidence: 99%

Patterning with block copolymer thin films

Segalman

2005

Materials Science and Engineering: R: Reports

931

921

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“…At a given molecular weight of PS homopolymer and temperature, the symmetric SI diblock copolymer showed the following morphological type variations as the homopolymer concentration increased (in other words, as the compositional asymmetry increased): lamellae, the ordered bicontinuous double-diamond morphology, cylinders on a hexagonal lattice, spheres on a cubic lattice, disordered micelles of various shapes, and macrophase separation. 11 Similar homopolymer-blending effects have also been identified in the cases of cylinder-or sphere-forming asymmetric block copolymers, [4][5][6][11][12][13][14] i.e., the size and periodic spacing of microdomains increased as the molecular weight and/or volume fraction of blended minority homopolymer increased. In this case, however, the size and periodic spacing could not be significantly enlarged in comparison to those of neat asymmetric block copolymer because the macrophase separation between the block copolymer and homopolymer frequently occurs at a considerably lower homopolymer molecular weight and/or volume fraction.…”

Section: Introductionmentioning

confidence: 59%

“…[2][3][4][5][6][7] According to the previous results already mentioned above, to increase the size and periodic spacing of a block copolymer microdomain, the amount of blended homopolymer should be increased. Thus, the blending method inevitably has a limitation in dimensional enlargement of microdomain due to the generation of macrophase separation between block copolymer and blended homopolymer above a certain amount of homopolymer.…”

Section: Introductionmentioning

confidence: 85%

“…1 Recently, block copolymer-homopolymer mixtures gained more interest in nanotechnological fields because a block copolymer microstructure can be easily modified to yield a desired phase structure and its domain periodicity on the nanoscopic level by simply adjusting the amount of incorporated homopolymer. [2][3][4][5][6][7] The phase behavior of a binary blend of block copolymer and homopolymer is primarily governed by the length of homopolymer chain compared to its counterpart block in the block copolymer and the amount of blended homopolymer. [8][9][10][11][12][13][14] Three different phase behaviors have been experimentally identified, depending on the degree of polymerization of homopolymer A, N AH , and that of the corresponding component of the block copolymer, N AC .…”

Section: Introductionmentioning

confidence: 99%

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Effects of substrate-blocks interactions on the phase behaviors of cylinder-forming block copolymers

Park

Sancaktar

2011

AIP Advances

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Self-assembly of block copolymers greatly facilitates production of controlled periodic nanostructures for nanotechnological applications. Orientation control in such structures with defect-free ordering on larger length scales still remain a major research challenge in many cases. In addition to their pure block forms, blends of copolymers with other polymers offer productive research areas in relation to nanostructure self-assembly. We prepared well-aligned nanocylinders in block copolymers over an enhanced sample area and height scale without using any external field applications. Self-assembled 3-dimensional perpendicular cylinder orientation was achieved mainly by blending of minority homopolymer into the block copolymer. In this work, we illustrate that the mixed cylinder nanodomain orientation exits in block copolymer mixtures even with a relatively strong homologous polymer pair interaction and a decreased domain-domain excess free energy, when the interfacial interaction between the majority component and the substrate is high enough to restrict the perpendicular nanodomain orientation. In case of overall perpendicular cylinder-forming block copolymer mixtures, on the other hand, the strong homologous PS pair interaction overcomes the limitation from the relatively high domain-substrate interfacial interactions.

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“…In a third approach, cross-linking the PS matrix in PS-b-PMMA BCPs by ozone plasma has also been demonstrated to generate pores with relatively small size [30]. The size of the pores ranged from 3 to 8 nm [31]. The pores were opened at the centre of the PMMA domains as the polymer chains relax when the thin film contracts during the cross-linking.…”

Section: (A) Ps-b-pi and Ps-b-pbmentioning

confidence: 99%

Pattern transfer using block copolymers

Gunkel

Russell

2013

Phil. Trans. R. Soc. A.

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To meet the increasing demand for patterning smaller feature sizes, a lithography technique is required with the ability to pattern sub-20 nm features. While top-down photolithography is approaching its limit in the continued drive to meet Moore's law, the use of directed self-assembly (DSA) of block copolymers (BCPs) offers a promising route to meet this challenge in achieving nanometre feature sizes. Recent developments in BCP lithography and in the DSA of BCPs are reviewed. While tremendous advances have been made in this field, there are still hurdles that need to be overcome to realize the full potential of BCPs and their actual use.

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Precise Control of Nanopore Size in Thin Film Using Mixtures of Asymmetric Block Copolymer and Homopolymer

Cited by 85 publications

References 21 publications

Patterning with block copolymer thin films

Patterning with block copolymer thin films

Effects of substrate-blocks interactions on the phase behaviors of cylinder-forming block copolymers

Pattern transfer using block copolymers

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