Ullmann's Encyclopedia of Industrial Chemistry 2012
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Polymers, High-Temperature
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Cited by 25 publications
(6 citation statements)
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Abstract
Smart CitationsHow this paper cites the one you are viewing
“…[ 44 ] 4,4’‐Difluorobenzophenone 3zh serves as the direct precursor to poly(etheretherketone) (PEEK), a high‐performance polymer widely used in aerospace, electronics, and nuclear industries for its heat, wear, and chemical resistance, as well as its mechanical and friction‐reducing properties. [ 45 , 46 ] 4,4’‐Dichlorobenzophenone 3zi is also a photosensitizer used in UV‐curable coatings and inks, [ 47 ] and 4‐phenylbenzophenone 3o is an essential intermediate in pharmaceuticals, for the synthesis of antifungal bifonazole and for the synthesis of photochromic benzopyran and naphthopyran compounds for coatings, lenses, and optical materials. It is also used in fungicidal imidazoles and as a photoinitiator.…”
Section: Results
mentioning
confidence: 99%
Abstract
Smart CitationsHow this paper cites the one you are viewing
“…[ 44 ] 4,4’‐Difluorobenzophenone 3zh serves as the direct precursor to poly(etheretherketone) (PEEK), a high‐performance polymer widely used in aerospace, electronics, and nuclear industries for its heat, wear, and chemical resistance, as well as its mechanical and friction‐reducing properties. [ 45 , 46 ] 4,4’‐Dichlorobenzophenone 3zi is also a photosensitizer used in UV‐curable coatings and inks, [ 47 ] and 4‐phenylbenzophenone 3o is an essential intermediate in pharmaceuticals, for the synthesis of antifungal bifonazole and for the synthesis of photochromic benzopyran and naphthopyran compounds for coatings, lenses, and optical materials. It is also used in fungicidal imidazoles and as a photoinitiator.…”
Section: Results
mentioning
confidence: 99%
Abstract
Smart CitationsHow this paper cites the one you are viewing
“…The wide selection of materials within this group has properties that vary greatly, such as mechanical strength, corrosion resistance and chemical compatibility. The temperature resistance of polymers is lower than that of ceramics and glasses, however, some can withstand relatively high temperatures, such as polyether ether ketone (PEEK) (250 °C) 27 and polytetrafluoroethylene (PTFE) (260 °C) 10. PTFE, being halogenated, has a low 1 H NMR background (the most commonly measured nucleus), however, due to the difference in magnetic susceptibility, it can induce artifacts 15.…”
Section: Methods
mentioning
confidence: 99%
Abstract
Smart CitationsHow this paper cites the one you are viewing
“…The limitation of sintering temperature was introduced by the PEEK, which has a melting point of 343 °C but undergoes a glass transition at 143 °C, while maintaining a continuous service temperature (temperature for which mechanical properties are maintained) of 250 °C. 38 This thermal limitation indicates that pellets should not be formed at temperatures around 143 °C and thermal sintering should be limited to ~250 ºC to avoid permanent deformation. PIP cells were produced with the internal diameters of 1 mm with an objective to attain a high spatial resolution (~2.4 µm in a labbased source, ~750 nm with synchrotron radiation) while retaining the entire field of view of the SE.…”
Section: Cell Construction and Operation
mentioning
confidence: 99%
Abstract
Smart CitationsHow this paper cites the one you are viewing
“…[ 44 ] 4,4’‐Difluorobenzophenone 3zh serves as the direct precursor to poly(etheretherketone) (PEEK), a high‐performance polymer widely used in aerospace, electronics, and nuclear industries for its heat, wear, and chemical resistance, as well as its mechanical and friction‐reducing properties. [ 45 , 46 ] 4,4’‐Dichlorobenzophenone 3zi is also a photosensitizer used in UV‐curable coatings and inks, [ 47 ] and 4‐phenylbenzophenone 3o is an essential intermediate in pharmaceuticals, for the synthesis of antifungal bifonazole and for the synthesis of photochromic benzopyran and naphthopyran compounds for coatings, lenses, and optical materials. It is also used in fungicidal imidazoles and as a photoinitiator.…”
Section: Results
mentioning
confidence: 99%
Abstract
Smart CitationsHow this paper cites the one you are viewing
“…The wide selection of materials within this group has properties that vary greatly, such as mechanical strength, corrosion resistance and chemical compatibility. The temperature resistance of polymers is lower than that of ceramics and glasses, however, some can withstand relatively high temperatures, such as polyether ether ketone (PEEK) (250 °C) 27 and polytetrafluoroethylene (PTFE) (260 °C) 10. PTFE, being halogenated, has a low 1 H NMR background (the most commonly measured nucleus), however, due to the difference in magnetic susceptibility, it can induce artifacts 15.…”
Section: Methods
mentioning
confidence: 99%
Abstract
Smart CitationsHow this paper cites the one you are viewing
“…The limitation of sintering temperature was introduced by the PEEK, which has a melting point of 343 °C but undergoes a glass transition at 143 °C, while maintaining a continuous service temperature (temperature for which mechanical properties are maintained) of 250 °C. 38 This thermal limitation indicates that pellets should not be formed at temperatures around 143 °C and thermal sintering should be limited to ~250 ºC to avoid permanent deformation. PIP cells were produced with the internal diameters of 1 mm with an objective to attain a high spatial resolution (~2.4 µm in a labbased source, ~750 nm with synchrotron radiation) while retaining the entire field of view of the SE.…”
Section: Cell Construction and Operation
mentioning
confidence: 99%
Abstract
Smart CitationsHow this paper cites the one you are viewing
“…[ 44 ] 4,4’‐Difluorobenzophenone 3zh serves as the direct precursor to poly(etheretherketone) (PEEK), a high‐performance polymer widely used in aerospace, electronics, and nuclear industries for its heat, wear, and chemical resistance, as well as its mechanical and friction‐reducing properties. [ 45 , 46 ] 4,4’‐Dichlorobenzophenone 3zi is also a photosensitizer used in UV‐curable coatings and inks, [ 47 ] and 4‐phenylbenzophenone 3o is an essential intermediate in pharmaceuticals, for the synthesis of antifungal bifonazole and for the synthesis of photochromic benzopyran and naphthopyran compounds for coatings, lenses, and optical materials. It is also used in fungicidal imidazoles and as a photoinitiator.…”
Section: Results
mentioning
confidence: 99%
Abstract
Smart CitationsHow this paper cites the one you are viewing
“…The wide selection of materials within this group has properties that vary greatly, such as mechanical strength, corrosion resistance and chemical compatibility. The temperature resistance of polymers is lower than that of ceramics and glasses, however, some can withstand relatively high temperatures, such as polyether ether ketone (PEEK) (250 °C) 27 and polytetrafluoroethylene (PTFE) (260 °C) 10. PTFE, being halogenated, has a low 1 H NMR background (the most commonly measured nucleus), however, due to the difference in magnetic susceptibility, it can induce artifacts 15.…”
Section: Methods
mentioning
confidence: 99%
Abstract
Smart CitationsHow this paper cites the one you are viewing
“…The limitation of sintering temperature was introduced by the PEEK, which has a melting point of 343 °C but undergoes a glass transition at 143 °C, while maintaining a continuous service temperature (temperature for which mechanical properties are maintained) of 250 °C. 38 This thermal limitation indicates that pellets should not be formed at temperatures around 143 °C and thermal sintering should be limited to ~250 ºC to avoid permanent deformation. PIP cells were produced with the internal diameters of 1 mm with an objective to attain a high spatial resolution (~2.4 µm in a labbased source, ~750 nm with synchrotron radiation) while retaining the entire field of view of the SE.…”
Section: Cell Construction and Operation
mentioning
confidence: 99%